Blazed Holographic Gratings By Selective Etching In Silicon

1979 ◽  
Author(s):  
J. Muller ◽  
R. Nietz ◽  
U. Unrau
Keyword(s):  
Selective Etching ◽  
Holographic Gratings

In Situ microscopy of the anodic etching of silicon

1995 ◽  
Vol 53 ◽  
pp. 232-233
Author(s):  
Frances M. Ross ◽  
Peter C. Searson
Keyword(s):  
Composite Structures ◽  
High Surface ◽  
High Surface Area ◽  
Chemical Properties ◽  
Selective Etching ◽  
Silicon On Insulator ◽  
Second Phase ◽  
Porous Layers ◽  
New Class ◽  
Porous Semiconductors

Porous semiconductors represent a relatively new class of materials formed by the selective etching of a single or polycrystalline substrate. Although porous silicon has received considerable attention due to its novel optical properties1, porous layers can be formed in other semiconductors such as GaAs and GaP. These materials are characterised by very high surface area and by electrical, optical and chemical properties that may differ considerably from bulk. The properties depend on the pore morphology, which can be controlled by adjusting the processing conditions and the dopant concentration. A number of novel structures can be fabricated using selective etching. For example, self-supporting membranes can be made by growing pores through a wafer, films with modulated pore structure can be fabricated by varying the applied potential during growth, composite structures can be prepared by depositing a second phase into the pores and silicon-on-insulator structures can be formed by oxidising a buried porous layer. In all these applications the ability to grow nanostructures controllably is critical.

Three-dimensional coupled wave study for finite-sized anisotropic volume holographic gratings under ultrashort pulsed beam readout

2007 ◽  
Vol 24 (6) ◽  
pp. 1799 ◽  
Author(s):  
Chunhua Wang ◽  
Liren Liu ◽  
Aimin Yan ◽  
Dean Liu ◽  
Yu Zhou ◽  
...  
Keyword(s):  
Three Dimensional ◽  
Holographic Gratings ◽  
Coupled Wave

Polarization holographic gratings in PAZO polymer films doped with particles of biometals

2021 ◽  
Vol 411 ◽  
pp. 113196
Author(s):  
A. Stoilova ◽  
G. Mateev ◽  
D. Nazarova ◽  
L. Nedelchev ◽  
E. Stoykova ◽  
...  
Keyword(s):  
Polymer Films ◽  
Holographic Gratings

scholarly journals Holographic Recording Performance of Acrylate-Based Photopolymer under Different Preparation Conditions for Waveguide Display

Polymers ◽  
2021 ◽  
Vol 13 (6) ◽  
pp. 936
Author(s):  
Zhongwen Shen ◽  
Yishi Weng ◽  
Yuning Zhang ◽  
Chuang Wang ◽  
Ao Liu ◽  
...  
Keyword(s):  
Augmented Reality ◽  
Diffraction Efficiency ◽  
Green Light ◽  
Holographic Recording ◽  
Holographic Gratings ◽  
Preparation Conditions

This work proposes a green light-sensitive acrylate-based photopolymer. The effects of the preparation conditions for the waveguide applied volume holographic gratings (VHGs) were experimentally investigated. The optimum preparation conditions for holographic recording were revealed. After optimization, the peak of VHG diffraction efficiency reached 99%, the diffractive wavelength bandwidth increased from 13 nm to 22 nm, and the corresponding RIM was 0.06. To prove the wide application prospect of the acrylate-based photopolymer in head-mounted augmented reality (AR) displays, green monochromatic volume holographic waveguides were fabricated. The display results showed that the prototype was able to achieve a 28° diagonal FOV and possessed a system luminance of 300 cd/m2.

scholarly journals Spectral multiplexing using stacked volume-phase holographic gratings – I

2017 ◽  
Vol 469 (2) ◽  
pp. 2412-2422 ◽  
Author(s):  
A. Zanutta ◽  
M. Landoni ◽  
M. Riva ◽  
A. Bianco
Keyword(s):  
Holographic Gratings ◽  
Volume Phase ◽  
Spectral Multiplexing

Fabrication of Antiswelling Loose Nanofiltration Membranes via a “Selective-Etching-Induced Reinforcing” Strategy for Bioseparation

2021 ◽  
Vol 13 (16) ◽  
pp. 19312-19323
Author(s):  
Shiwei Guo ◽  
Huiru Zhang ◽  
Xiangrong Chen ◽  
Shichao Feng ◽  
Yinhua Wan ◽  
...  
Keyword(s):  
Selective Etching ◽  
Nanofiltration Membranes

Comparison Between Three Si1-xGex versus Si Selective Etching Processes

2019 ◽  
Vol 16 (10) ◽  
pp. 439-449 ◽  
Author(s):  
Thierry Salvetat ◽  
Vincent Destefanis ◽  
Stephan Borel ◽  
Jean-Michel Hartmann ◽  
Olivier Kermarrec ◽  
...  
Keyword(s):  
Selective Etching

Technique for Large Elevation of Source/Drain Using Implantation Mediated Selective Etching

2003 ◽  
Vol 6 (10) ◽  
pp. G117 ◽  
Author(s):  
M. Q. Huda ◽  
K. Sakamoto ◽  
H. Tanoue
Keyword(s):  
Selective Etching

scholarly journals Effect of input power and gas pressure on the roughening and selective etching of SiO2/Si surfaces in reactive plasmas

2010 ◽  
Vol 17 (9) ◽  
pp. 094501 ◽  
Author(s):  
X. X. Zhong ◽  
E. Tam ◽  
X. Z. Huang ◽  
P. Colpo ◽  
F. Rossi ◽  
...  
Keyword(s):  
Input Power ◽  
Selective Etching ◽  
Gas Pressure
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