Improved Thermal Stability Of High Resolution Positive Photoresists Via Elevated Softbake Temperatures

Author(s):  
Marc T. Aronhime ◽  
Chava Gal ◽  
Shoshana Silady ◽  
John J. Grunwald ◽  
Donald W. Johnson ◽  
...  
Langmuir ◽  
2012 ◽  
Vol 28 (38) ◽  
pp. 13624-13635 ◽  
Author(s):  
F. P. Cometto ◽  
E. M. Patrito ◽  
P. Paredes Olivera ◽  
G. Zampieri ◽  
H. Ascolani

2011 ◽  
Vol 605 (23-24) ◽  
pp. 1925-1928 ◽  
Author(s):  
S. McDonnell ◽  
B. Brennan ◽  
P. Casey ◽  
G.J. Hughes

2007 ◽  
Vol 111 (49) ◽  
pp. 18204-18213 ◽  
Author(s):  
Bengt Jaeckel ◽  
Ralf Hunger ◽  
Lauren J. Webb ◽  
Wolfram Jaegermann ◽  
Nathan S. Lewis

2004 ◽  
Vol 467-470 ◽  
pp. 1345-1352 ◽  
Author(s):  
A.A. Rasmussen ◽  
Ali Gholinia ◽  
Patrick W. Trimby ◽  
Marcel A.J. Somers

The influence of heat treatment on the microstructure and the microtexture of electrodeposited Ni and Ni-Co layers was investigated with Electron Backscatter Diffraction (EBSD) with high resolution. Samples were annealed for 1 hour at 523 K and 673 K, the temperature region wherein recrystallisation occurs. The results are discussed in relation to the resolution of EBSD for the very fine grained electrodeposits and previous X-ray diffraction investigations.


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