High-Resolution Synchrotron Photoemission Studies of the Electronic Structure and Thermal Stability of CH3- and C2H5-Functionalized Si(111) Surfaces

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Vol 111 (49) ◽  
pp. 18204-18213 ◽  
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Bengt Jaeckel ◽  
Ralf Hunger ◽  
Lauren J. Webb ◽  
Wolfram Jaegermann ◽  
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Thermal Stability ◽  
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High Resolution ◽  
Thermal Stability Of

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Vol 52 (2) ◽  
pp. 501-505 ◽  
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Chang Q Sun ◽  
H.L Bai ◽  
S Li ◽  
B.K Tay ◽  
E.Y Jiang
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Thermal Stability ◽  
Electronic Structure ◽  
Size Effect ◽  
Thermal Stability Of

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Langmuir ◽  
2012 ◽  
Vol 28 (38) ◽  
pp. 13624-13635 ◽  
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F. P. Cometto ◽  
E. M. Patrito ◽  
P. Paredes Olivera ◽  
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Characterization of the electronic structure and thermal stability of HfO2 /SiO2 /Si gate dielectric stack

2017 ◽  
Vol 49 (8) ◽  
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Author(s):  
T. L. Duan ◽  
L. Pan ◽  
Z. Zhang ◽  
E. S. Tok ◽  
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Thermal Stability ◽  
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Thermal Stability Of

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Vol 605 (23-24) ◽  
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S. McDonnell ◽  
B. Brennan ◽  
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Thermal Stability ◽  
High Resolution ◽  
Photoemission Study ◽  
Thermal Stability Of
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