High resolution photoemission study of the thermal stability of the HfO2/SiOx/Si(111) system
2011 ◽
Vol 605
(23-24)
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pp. 1925-1928
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Keyword(s):
2012 ◽
Vol 606
(15-16)
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pp. 1215-1220
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2007 ◽
Vol 111
(49)
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pp. 18204-18213
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2011 ◽
Vol 13
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pp. 11471
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2020 ◽
Vol 124
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pp. 20889-20897
2006 ◽
Vol 91
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pp. 629-633
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