Investigation of acid diffusion during laser spike annealing with systematically designed photoacid generators

2012 ◽  
Author(s):  
Marie Krysak ◽  
Byungki Jung ◽  
Michael O. Thompson ◽  
Christopher K. Ober
Keyword(s):  
Acid Diffusion ◽  
Photoacid Generators ◽  
Spike Annealing

Characterization and acid diffusion measurements of new strong acid photoacid generators

2002 ◽  
Author(s):  
Gregory M. Wallraff ◽  
Carl E. Larson ◽  
Nicolette Fender ◽  
Blake Davis ◽  
David R. Medeiros ◽  
...  
Keyword(s):  
Strong Acid ◽  
Acid Diffusion ◽  
Photoacid Generators

Novel Anionic Photoacid Generators (PAGs) and Photoresists for sub 50 nm Patterning by EUVL and EBL

2006 ◽  
Vol 961 ◽  
Author(s):  
Mingxing Wang ◽  
Cheng-Tsung Lee ◽  
Clifford L Henderson ◽  
Wang Yueh ◽  
Jeanette M Roberts ◽  
...  
Keyword(s):  
Main Chain ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Polymer Main Chain ◽  
Acid Diffusion ◽  
Photoacid Generators ◽  
20 Nm ◽  
Line Space

ABSTRACTA new series of anionic photoacid generators (PAGs), and corresponding polymers were prepared. The thermostability of PAG bound polymers was superior to PAG blend polymers. PAG incorporated into the polymer main chain may improve acid diffusion compared with the PAG blend polymers, which was demonstrated by Extreme Ultraviolet lithography (EUVL) results: the fluorine PAG bound polymer resist gave 45 nm (1:1), 35 nm (1:2), 30 nm (1:3) and 20 nm (1:4) Line/Space as well as 50 nm (1:1) elbow patterned, showed better resolution than the blend sample.

Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics

2014 ◽  
Vol 13 (4) ◽  
pp. 043017 ◽  
Author(s):  
Abhijit A. Patil ◽  
Yogendra Narayan Pandey ◽  
Manolis Doxastakis ◽  
Gila E. Stein
Keyword(s):  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

scholarly journals Diffusion and Distribution Studies of Photoacid Generators. Ion Beam Analysis in Lithograpy.

1999 ◽  
Vol 12 (3) ◽  
pp. 457-467 ◽  
Author(s):  
Narayan Sundararajan ◽  
Christopher F. Keimel ◽  
Navin Bhargava ◽  
Christopher K. Ober ◽  
Juliann Opitz ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Analysis ◽  
Photoacid Generators ◽  
Beam Analysis ◽  
Distribution Studies
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