Study of dust-pollution-induced laser damage on fused silica surface

2011 ◽  
Author(s):  
Xinda Zhou ◽  
Jin Huang ◽  
Fengrui Wang ◽  
Hongjie Liu ◽  
Xiaodong Jiang
Keyword(s):  
Silica Surface ◽  
Fused Silica ◽  
Laser Damage ◽  
Dust Pollution

scholarly journals Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching

RSC Advances ◽  
2018 ◽  
Vol 8 (57) ◽  
pp. 32417-32422
Author(s):  
Laixi Sun ◽  
Ting Shao ◽  
Jianfeng Xu ◽  
Xiangdong Zhou ◽  
Xin Ye ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Silica Surface ◽  
Ion Beam ◽  
Fused Silica ◽  
Laser Damage ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching

RIBE and DCE techniques can be combined to tracelessly mitigate laser damage precursors on a fused silica surface.

CO2laser mitigation of the ultraviolet laser damage site on a fused silica surface

2014 ◽  
Vol 53 (8) ◽  
pp. 084107 ◽  
Author(s):  
Zhou Fang ◽  
Yuan’an Zhao ◽  
Wei Sun ◽  
Zehan Li ◽  
Guohang Hu ◽  
...  
Keyword(s):  
Silica Surface ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Site ◽  
Ultraviolet Laser

Mitigation of Ultraviolet Laser Damage on Fused Silica Surface with Femtosecond Laser System

2013 ◽  
Vol 40 (4) ◽  
pp. 0403001 ◽  
Author(s):  
方周 Fang Zhou ◽  
赵元安 Zhao Yuan′an ◽  
陈顺利 Chen Shunli ◽  
胡国行 Hu Guohang ◽  
刘文文 Liu Wenwen ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Silica Surface ◽  
Laser System ◽  
Fused Silica ◽  
Laser Damage ◽  
Ultraviolet Laser

scholarly journals Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1294
Author(s):  
Yaoyu Zhong ◽  
Yifan Dai ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
...  
Keyword(s):  
Silica Surface ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Structural Defects ◽  
Laser Damage ◽  
Material Structure ◽  
Ion Beam Etching ◽  
Damage Resistance ◽  
Laser Induced Damage

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

Experimental study of 355 nm laser damage ignited by Fe and Ce impurities on fused silica surface

2019 ◽  
Vol 95 ◽  
pp. 109231
Author(s):  
Liu Hongjie ◽  
Wang Fengrui ◽  
Huang Jin ◽  
Meng Jie ◽  
Ma yongjun ◽  
...  
Keyword(s):  
Experimental Study ◽  
Silica Surface ◽  
Fused Silica ◽  
Laser Damage

Anisotropic ion beam etching of fused silica to mitigate subsurface damage

2020 ◽  
Vol 34 (08) ◽  
pp. 2050060 ◽  
Author(s):  
Bo Li ◽  
Xia Xiang ◽  
Chengxiang Tian ◽  
Chunyuan Hou ◽  
Wei Liao ◽  
...  
Keyword(s):  
Surface Quality ◽  
Surface Defects ◽  
Silica Surface ◽  
Incident Angle ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Laser Damage Threshold ◽  
Laser Damage ◽  
Ion Beam Etching

The laser damage resistance of fused silica optics depends significantly on the surface quality. In this work, anisotropic etching with inert ion beams at various ion incident angles was performed to investigate the evolution of the fused silica surface. The results show that the surface is smoothed when the incident angle is below [Formula: see text]. However, the fused silica surface starts to become coarse owing to the formation of nanostructures on the surface when the incident angle exceeds [Formula: see text]. Further, ion beam etching at a large incident angle of [Formula: see text] removes subsurface defects and less induces nanostructures, resulting in reduction of the surface roughness. The concentrations of impurities and defects are both significantly reduced after ion beam etching. The surface quality, subsurface and surface defects, and surface impurities determine the variation in the laser damage threshold of fused silica with the ion incident angle. The results demonstrate successful application of ion beam etching to improve the laser damage resistant characteristics of fused silica optics. Ion beam etching is a very versatile tool that provides physical erosion to anisotropically mitigate surface damage of fused silica.

Method of mitigation laser-damage growth on fused silica surface

2013 ◽  
Vol 52 (29) ◽  
pp. 7186 ◽  
Author(s):  
Zhou Fang ◽  
Yuan’an Zhao ◽  
Shunli Chen ◽  
Wei Sun ◽  
Jianda Shao
Keyword(s):  
Silica Surface ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Growth

scholarly journals Understanding the effect of HF-based wet shallow etching on optical performance of reactive-ion-etched fused silica optics

RSC Advances ◽  
2021 ◽  
Vol 11 (47) ◽  
pp. 29323-29332
Author(s):  
Laixi Sun ◽  
Ting Shao ◽  
Xinda Zhou ◽  
Weihua Li ◽  
Fenfei Li ◽  
...  
Keyword(s):  
Silica Surface ◽  
Fused Silica ◽  
Laser Damage ◽  
Optical Performance ◽  
Damage Resistance

The addition of NH4F to HF solution is important for producing a smooth fused silica surface with good laser damage resistance.

A recycling strategy of ion beam removal and recoating of sol-gel film on fused silica surface

Optik ◽  
2021 ◽  
pp. 167259
Author(s):  
Wenfeng Sun ◽  
Xia Xiang ◽  
Bo Li ◽  
Xiang Dong ◽  
Xiaolong Jiang ◽  
...  
Keyword(s):  
Silica Surface ◽  
Ion Beam ◽  
Sol Gel ◽  
Fused Silica ◽  
Gel Film
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