scholarly journals Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching

RSC Advances ◽  
2018 ◽  
Vol 8 (57) ◽  
pp. 32417-32422
Author(s):  
Laixi Sun ◽  
Ting Shao ◽  
Jianfeng Xu ◽  
Xiangdong Zhou ◽  
Xin Ye ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Silica Surface ◽  
Ion Beam ◽  
Fused Silica ◽  
Laser Damage ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching

RIBE and DCE techniques can be combined to tracelessly mitigate laser damage precursors on a fused silica surface.

scholarly journals Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1294
Author(s):  
Yaoyu Zhong ◽  
Yifan Dai ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
...  
Keyword(s):  
Silica Surface ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Structural Defects ◽  
Laser Damage ◽  
Material Structure ◽  
Ion Beam Etching ◽  
Damage Resistance ◽  
Laser Induced Damage

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

Anisotropic ion beam etching of fused silica to mitigate subsurface damage

2020 ◽  
Vol 34 (08) ◽  
pp. 2050060 ◽  
Author(s):  
Bo Li ◽  
Xia Xiang ◽  
Chengxiang Tian ◽  
Chunyuan Hou ◽  
Wei Liao ◽  
...  
Keyword(s):  
Surface Quality ◽  
Surface Defects ◽  
Silica Surface ◽  
Incident Angle ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Laser Damage Threshold ◽  
Laser Damage ◽  
Ion Beam Etching

The laser damage resistance of fused silica optics depends significantly on the surface quality. In this work, anisotropic etching with inert ion beams at various ion incident angles was performed to investigate the evolution of the fused silica surface. The results show that the surface is smoothed when the incident angle is below [Formula: see text]. However, the fused silica surface starts to become coarse owing to the formation of nanostructures on the surface when the incident angle exceeds [Formula: see text]. Further, ion beam etching at a large incident angle of [Formula: see text] removes subsurface defects and less induces nanostructures, resulting in reduction of the surface roughness. The concentrations of impurities and defects are both significantly reduced after ion beam etching. The surface quality, subsurface and surface defects, and surface impurities determine the variation in the laser damage threshold of fused silica with the ion incident angle. The results demonstrate successful application of ion beam etching to improve the laser damage resistant characteristics of fused silica optics. Ion beam etching is a very versatile tool that provides physical erosion to anisotropically mitigate surface damage of fused silica.

Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks

2015 ◽  
Vol 141 ◽  
pp. 289-293 ◽  
Author(s):  
Joachim Zajadacz ◽  
Pierre Lorenz ◽  
Frank Frost ◽  
Renate Fechner ◽  
Christian Steinberg ◽  
...  
Keyword(s):  
Diblock Copolymer ◽  
Ion Beam ◽  
Fused Silica ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching

scholarly journals Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Micromachines ◽  
2021 ◽  
Vol 12 (10) ◽  
pp. 1226
Author(s):  
Wanli Zhang ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
Yongxiang Shen
Keyword(s):  
Chemical Etching ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance ◽  
Etching Depth ◽  
Treatment Processes ◽  
Laser Induced Damage ◽  
Combined Technique

The enhancement of laser damage resistance of fused silica optics was a hotspot in scientific research. At present, a variety of modern processes have been produced to improve the laser induced damage threshold (LIDT) of fused silica optics. They included pre-treatment processes represented by flexible computer controlled optical surfacing (CCOS), magnetorheological finishing (MRF), ion beam finishing (IBF), and post-treatment processes represented by dynamic chemical etching (DCE). These have achieved remarkable results. However, there are still some problems that need to be solved urgently, such as excessive material removal, surface accuracy fluctuation in the DCE process, and the pollution in MRF process, etc. In view of above problems, an MRF, CCOS, IBF and shallow DCE combined technique was used to process fused silica optics. The surface morphology could be greatly controlled and chemical etching depth was reduced, while the LIDT increased steadily. After processing by this combined technique, the LIDT increased to 12.1 J/cm2 and the laser damage resistance properties of fused silica were significantly enhanced. In general, the MRF, IBF, CCOS and shallow DCE combined technique brought much help to the enhancement of laser damage resistance of fused silica, and could be used as a process route in the manufacturing process of fused silica.

A recycling strategy of ion beam removal and recoating of sol-gel film on fused silica surface

Optik ◽  
2021 ◽  
pp. 167259
Author(s):  
Wenfeng Sun ◽  
Xia Xiang ◽  
Bo Li ◽  
Xiang Dong ◽  
Xiaolong Jiang ◽  
...  
Keyword(s):  
Silica Surface ◽  
Ion Beam ◽  
Sol Gel ◽  
Fused Silica ◽  
Gel Film

Reactive Ion Beam Etching Using a Selective Gallium Doping Method

1989 ◽  
Vol 28 (Part 2, No. 9) ◽  
pp. L1671-L1672
Author(s):  
Kyusaku Nishioka ◽  
Hiroaki Morimoto ◽  
Yoji Mashiko ◽  
Tadao Kato
Keyword(s):  
Ion Beam ◽  
Ion Beam Etching ◽  
Gallium Doping ◽  
Reactive Ion Beam Etching
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