The impact ionization coefficient in dielectric materials revisited

2011 ◽  
Author(s):  
C. Karras ◽  
Z. Sun ◽  
D. N. Nguyen ◽  
L. A. Emmert ◽  
W. Rudolph
Keyword(s):  
Impact Ionization ◽  
Dielectric Materials ◽  
Ionization Coefficient ◽  
The Impact

Modeling of a Breakdown Voltage in GaN Rectifiers and SiC Rectifiers

2001 ◽  
Vol 680 ◽  
Author(s):  
You-Sang Lee ◽  
Min-Koo Han ◽  
Yearn-Ik Choi
Keyword(s):  
Breakdown Voltage ◽  
Epitaxial Layer ◽  
Doping Concentration ◽  
Impact Ionization ◽  
Accurate Approximation ◽  
Ionization Coefficient ◽  
Zinc Blende ◽  
The Impact

ABSTRACTThe breakdown voltage of wurtzite and zinc-blende GaN rectifiers as function of a doping concentration and the width of epitaxial layer were successfully modeled in the reach-through case. The breakdown voltage was derived by the impact ionization integral employing the effective impact ionization coefficient and an accurate approximation. Our model shows that the breakdown voltage of wurtzite GaN rectifier was larger than those of zinc-blende GaN rectifier and SiC rectifiers including 4H-SiC and 6H-SiC in the condition that both the thickness and doping concentration of epitaxial layer are identical.

The Closed-Form Solutions For The Breakdown Voltages Of 6H-SiC Reachthrough Diodes

1998 ◽  
Vol 512 ◽  
Author(s):  
You-Sang Lee ◽  
D.-S. Byeon ◽  
Y.-I. Choi ◽  
I.-Y. Park ◽  
Min-Koo Han
Keyword(s):  
Closed Form ◽  
Breakdown Voltage ◽  
Epitaxial Layer ◽  
Doping Concentration ◽  
Impact Ionization ◽  
Analytic Solutions ◽  
Ionization Coefficient ◽  
Closed Form Solutions ◽  
The Impact ◽  
Effective Ionization

ABSTRACTThe closed-form analytic solutions for the breakdown voltage of 6H-SiC RTD, reachthrough diode, having the structure of p+-n-n+, are successfully derived by solving the impact ionization integral using effective ionization coefficient in the reachthrough condition. In the region of the lowly doped epitaxial layer, the breakdown voltages of 6H-SiC RTD nearly constant with the increased doping concentration. Also the breakdown voltages of 6H-SiC RTD decrease, in the region of the highly doped epitaxial layer, which coincides with Baliga'seq. [1].

Impact ionization threshold energy of trigonal selenium: An ab initio study

2013 ◽  
Vol 91 (6) ◽  
pp. 483-485 ◽  
Author(s):  
A. Darbandi ◽  
O. Rubel
Keyword(s):  
Impact Ionization ◽  
Threshold Energy ◽  
Charge Carriers ◽  
Ionization Threshold ◽  
Ab Initio Study ◽  
Ionization Coefficient ◽  
Semiconducting Material ◽  
Band Dispersion ◽  
Crude Approximation ◽  
The Impact

Impact ionization coefficient is a critical parameter that determines the multiplication gain in avalanche photodiodes. The impact ionization coefficient is closely related to the ionization threshold, Eth, which is determined by the band dispersion of the semiconducting material used in detectors. The ionization threshold energy is commonly calculated based on a parabolic band assumption, which provides only a crude approximation. Here we present a first principle study of the ionization threshold energy through an analysis of the electronic structure of trigonal selenium. It is shown that the excess energy of primary charge carriers required to initiate the impact ionization in trigonal selenium can be as low as the band gap, Eg, which is a sharp contrast to the parabolic band approximation that implies Eth = 3/2Eg. Such a low Eth value is a favourable factor for impact ionization.

Low-voltage Avalanche Breakdown in AlGaN Multi-quantum Wells

2006 ◽  
Vol 955 ◽  
Author(s):  
Shengkun Zhang ◽  
X. Zhou ◽  
Wubao Wang ◽  
R. R. Alfano ◽  
A. M. Dabiran ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Electric Fields ◽  
Impact Ionization ◽  
Low Voltage ◽  
Defect Density ◽  
Control Sample ◽  
Avalanche Breakdown ◽  
Ionization Coefficient ◽  
The Impact ◽  
Injection Modes

ABSTRACTIn this work, electro-luminescence (EL) of a AlGaN p-i-n diode have been investigated in both avalanche and injection modes. The active i-region of the diode consists of Al0.1Ga0.9N/Al0.15Ga0.85N MQWs. Strong interband luminescence from the Al0.1Ga0.9N active layers was observed when operating the device in both avalanche and injection modes. The threshold voltage for avalanche breakdown is as low as 9 V. This indicates that the impact ionization coefficient of electrons is greatly enhanced in these Al0.1Ga0.9N/Al0.15Ga0.85N MQWs comparing to AlGaN bulk materials. Polarization-induced electric fields in the Al0.1Ga0.9N well layers are believed to be responsible for the enhancement of the ionization coefficient. In a control sample that has higher defect density, the electroluminescence was dominated by long-wavelength emissions, which results from impact ionizations of the defect levels.

Observation and Analysis of a Non-Uniform Avalanche Phenomenon in 4H-SiC 4°-Off (0001) p-n Diodes Terminated with a Floating-Field Ring

2015 ◽  
Vol 821-823 ◽  
pp. 640-643 ◽  
Author(s):  
Kazuhiro Mochizuki ◽  
Hiroyuki Okino ◽  
Hiroyuki Matsushima ◽  
Yoshiaki Toyota
Keyword(s):  
Opposite Direction ◽  
Impact Ionization ◽  
Two Dimensional ◽  
Ionization Coefficient ◽  
Dry Oxidation ◽  
Aluminum Implantation ◽  
Dimensional Simulation ◽  
The Impact

4H-SiC (0001) p-n diodes terminated with a floating-field ring were found to emit light at breakdown in the opposite direction to that of substrate misorientation when the diodes were fabricated by aluminum implantation and dry-oxidation passivation. Two-dimensional simulation revealed that such non-uniform breakdown was mainly attributable to the asymmetric lateral straggling of implanted aluminum acceptors, rather than the anisotropic nature of the impact ionization coefficient.

scholarly journals Engineered tunneling layer with enhanced impact ionization for detection improvement in graphene/silicon heterojunction photodetectors

2021 ◽  
Vol 10 (1) ◽  
Author(s):  
Jun Yin ◽  
Lian Liu ◽  
Yashu Zang ◽  
Anni Ying ◽  
Wenjie Hui ◽  
...  
Keyword(s):  
High Performance ◽  
Impact Ionization ◽  
Low Cost ◽  
Atomic Layer ◽  
Light Illumination ◽  
Insulation Material ◽  
Defect States ◽  
Uv Illumination ◽  
Layer Deposition ◽  
The Impact

AbstractHere, an engineered tunneling layer enhanced photocurrent multiplication through the impact ionization effect was proposed and experimentally demonstrated on the graphene/silicon heterojunction photodetectors. With considering the suitable band structure of the insulation material and their special defect states, an atomic layer deposition (ALD) prepared wide-bandgap insulating (WBI) layer of AlN was introduced into the interface of graphene/silicon heterojunction. The promoted tunneling process from this designed structure demonstrated that can effectively help the impact ionization with photogain not only for the regular minority carriers from silicon, but also for the novel hot carries from graphene. As a result, significantly enhanced photocurrent as well as simultaneously decreased dark current about one order were accomplished in this graphene/insulation/silicon (GIS) heterojunction devices with the optimized AlN thickness of ~15 nm compared to the conventional graphene/silicon (GS) devices. Specifically, at the reverse bias of −10 V, a 3.96-A W−1 responsivity with the photogain of ~5.8 for the peak response under 850-nm light illumination, and a 1.03-A W−1 responsivity with ∼3.5 photogain under the 365 nm ultraviolet (UV) illumination were realized, which are even remarkably higher than those in GIS devices with either Al2O3 or the commonly employed SiO2 insulation layers. This work demonstrates a universal strategy to fabricate broadband, low-cost and high-performance photo-detecting devices towards the graphene-silicon optoelectronic integration.

scholarly journals Raman scattering in high-refractive-index nanostructures

Nanophotonics ◽  
2020 ◽  
Vol 0 (0) ◽  
Author(s):  
Søren Raza ◽  
Anders Kristensen
Keyword(s):  
Raman Spectroscopy ◽  
Refractive Index ◽  
Raman Scattering ◽  
Bound States ◽  
Stimulated Raman Scattering ◽  
Dielectric Materials ◽  
High Refractive Index ◽  
Surface Enhanced Raman Spectroscopy ◽  
Raman Enhancement ◽  
The Impact

AbstractThe advent of resonant dielectric nanomaterials has provided a new path for concentrating and manipulating light on the nanoscale. Such high-refractive-index materials support a diverse set of low-loss optical resonances, including Mie resonances, anapole states, and bound states in the continuum. Through these resonances, high-refractive-index materials can be used to engineer the optical near field, both inside and outside the nanostructures, which opens up new opportunities for Raman spectroscopy. In this review, we discuss the impact of high-refractive-index nano-optics on Raman spectroscopy. In particular, we consider the intrinsic Raman enhancement produced by different dielectric resonances and their theoretical description. Using the optical reciprocity theorem, we derive an expression which links the Raman enhancement to the enhancement of the stored electric energy. We also address recent results on surface-enhanced Raman spectroscopy based on high-refractive-index dielectric materials along with applications in stimulated Raman scattering and nanothermometry. Finally, we discuss the potential of Raman spectroscopy as a tool for detecting the optical near-fields produced by dielectric resonances, complementing reflection and transmission measurements.

Temperature Dependence of Hole Impact Ionization Coefficient in 4H-SiC Photodiodes

2009 ◽  
Vol 615-617 ◽  
pp. 311-314 ◽  
Author(s):  
W.S. Loh ◽  
J.P.R. David ◽  
B.K. Ng ◽  
Stanislav I. Soloviev ◽  
Peter M. Sandvik ◽  
...  
Keyword(s):  
Phonon Scattering ◽  
Impact Ionization ◽  
Positive Temperature Coefficient ◽  
Positive Temperature ◽  
Different Temperatures ◽  
Ionization Coefficients ◽  
Increasing Temperature ◽  
The Impact ◽  
Good Agreement ◽  
Ionization Rates

Hole initiated multiplication characteristics of 4H-SiC Separate Absorption and Multiplication Avalanche Photodiodes (SAM-APDs) with a n- multiplication layer of 2.7 µm were obtained using 325nm excitation at temperatures ranging from 300 to 450K. The breakdown voltages increased by 200mV/K over the investigated temperature range, which indicates a positive temperature coefficient. Local ionization coefficients, including the extracted temperature dependencies, were derived in the form of the Chynoweth expression and were used to predict the hole multiplication characteristics at different temperatures. Good agreement was obtained between the measured and the modeled multiplication using these ionization coefficients. The impact ionization coefficients decreased with increasing temperature, corresponding to an increase in breakdown voltage. This result agrees well with the multiplication characteristics and can be attributed to phonon scattering enhanced carrier cooling which has suppressed the ionization process at high temperatures. Hence, a much higher electric field is required to achieve the same ionization rates.

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