Adaptive high-speed high-resolution quantization for image sensors

2009 ◽  
Author(s):  
Y. S. Poberezhskiy
Keyword(s):  
High Resolution ◽  
High Speed ◽  
Image Sensors

Optical properties of photoconductor using crystalline selenium

2014 ◽  
Vol 92 (7/8) ◽  
pp. 645-647 ◽  
Author(s):  
Shigeyuki Imura ◽  
Kenji Kikuchi ◽  
Kazunori Miyakawa ◽  
Misao Kubota
Keyword(s):  
High Resolution ◽  
High Speed ◽  
Metal Electrode ◽  
Image Sensors ◽  
High Quantum Efficiency ◽  
Suitable Material ◽  
Light Region ◽  
Highly Sensitive ◽  
Photosensitive Layer ◽  
High Absorption Coefficient

Recently, there has been an increased need for highly sensitive solid-state imaging devices to develop high-resolution and high-speed image sensors. Crystalline selenium is a suitable material for a photosensitive layer because of its high absorption coefficient in the visible light region. In our experiment with an image pick-up tube using crystalline selenium as a photosensitive layer, a high-resolution image was obtained for the first time. In addition, test sandwich cells have been fabricated to demonstrate a large photocurrent multiplication phenomenon with very high quantum efficiency greatly exceeding unity as a result of injection carriers from an external electrode caused by a high electric field at the interface between the crystalline selenium and the metal electrode.

scholarly journals 4+1-transistor pixel architecture for high-speed, high-resolution CMOS image sensors

2011 ◽  
Vol 47 (22) ◽  
pp. 1221 ◽  
Author(s):  
A. Xhakoni ◽  
D. San Segundo Bello ◽  
P. De Wit ◽  
G. Gielen
Keyword(s):  
High Resolution ◽  
High Speed ◽  
Image Sensors ◽  
Cmos Image Sensors

Electrical Probing and Surface Imaging of Deep Sub-Micron Integrated Circuits

1999 ◽  
Author(s):  
Kenneth Krieg ◽  
Richard Qi ◽  
Douglas Thomson ◽  
Greg Bridges
Keyword(s):  
High Resolution ◽  
Integrated Circuits ◽  
Real Time ◽  
High Speed ◽  
Time Signal ◽  
Surface Imaging ◽  
Atomic Force ◽  
Submicron Structures ◽  
High Resolution Images ◽  
Capacitive Loading

Abstract A contact probing system for surface imaging and real-time signal measurement of deep sub-micron integrated circuits is discussed. The probe fits on a standard probe-station and utilizes a conductive atomic force microscope tip to rapidly measure the surface topography and acquire real-time highfrequency signals from features as small as 0.18 micron. The micromachined probe structure minimizes parasitic coupling and the probe achieves a bandwidth greater than 3 GHz, with a capacitive loading of less than 120 fF. High-resolution images of submicron structures and waveforms acquired from high-speed devices are presented.

scholarly journals Full-color nanorouter for high-resolution imaging

Nanoscale ◽  
2021 ◽  
Author(s):  
Mingjie Chen ◽  
Long Wen ◽  
Dahui Pan ◽  
David Cumming ◽  
Xianguang Yang ◽  
...  
Keyword(s):  
High Resolution ◽  
Color Image ◽  
Image Sensors ◽  
Structural Color ◽  
High Resolution Imaging ◽  
Scaling Effects ◽  
Full Color ◽  
Resolution Imaging

Pixel scaling effects have been a major issue for the development of high-resolution color image sensors due to the reduced photoelectric signal and the color crosstalk. Various structural color techniques...

High-speed high-resolution CMOS voltage comparator

1986 ◽  
Vol 22 (6) ◽  
pp. 338 ◽  
Author(s):  
W.T. Ng ◽  
C.A.T. Salama
Keyword(s):  
High Resolution ◽  
High Speed ◽  
Voltage Comparator

A High Speed, High Resolution Remote MCA

1985 ◽  
Vol 32 (1) ◽  
pp. 100-104
Author(s):  
D. J. Roberts ◽  
J. J. Gregorio
Keyword(s):  
High Resolution ◽  
High Speed
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