Nanometer-scale manipulator and ultrasonic cutter using an atomic force microscope controlled by a haptic device

2008 ◽  
Author(s):  
F. Iwata ◽  
S. Kawanishi ◽  
A. Sasaki ◽  
H. Aoyama ◽  
T. Ushiki
Keyword(s):  
Atomic Force Microscope ◽  
Haptic Device ◽  
Nanometer Scale ◽  
Atomic Force

Nanometer-Scale Manipulation and Ultrasonic Cutting Using an Atomic Force Microscope Controlled by a Haptic Device as a Human Interface

2008 ◽  
Vol 47 (7) ◽  
pp. 6181-6185 ◽  
Author(s):  
Futoshi Iwata ◽  
Kouhei Ohara ◽  
Yuichi Ishizu ◽  
Akira Sasaki ◽  
Hisayuki Aoyama ◽  
...  
Keyword(s):  
Atomic Force Microscope ◽  
Haptic Device ◽  
Nanometer Scale ◽  
Human Interface ◽  
Atomic Force ◽  
Ultrasonic Cutting

A Study of the Photoelectric Effect Caused by a Laser Beam Used in a Beam Bounce Technique in a C-AFM System

2008 ◽  
Author(s):  
Hung-Sung Lin ◽  
Mong-Sheng Wu
Keyword(s):  
Laser Beam ◽  
Failure Analysis ◽  
Atomic Force Microscope ◽  
Photoelectric Effect ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Electrical Characteristics ◽  
Atomic Force ◽  
Probe Microscope ◽  
Probe Head

Abstract The use of a scanning probe microscope (SPM), such as a conductive atomic force microscope (C-AFM) has been widely reported as a method of failure analysis in nanometer scale science and technology [1-6]. A beam bounce technique is usually used to enable the probe head to measure extremely small movements of the cantilever as it is moved across the surface of the sample. However, the laser beam used for a beam bounce also gives rise to the photoelectric effect while we are measuring the electrical characteristics of a device, such as a pn junction. In this paper, the photocurrent for a device caused by photon illumination was quantitatively evaluated. In addition, this paper also presents an example of an application of the C-AFM as a tool for the failure analysis of trap defects by taking advantage of the photoelectric effect.

scholarly journals Nanometer-scale Mechanical Processing of Muscovite Mica by Atomic Force Microscope.

1997 ◽  
Vol 63 (3) ◽  
pp. 426-430 ◽  
Author(s):  
Shojiro MIYAKE ◽  
Masanori ISHII ◽  
Toshiaki OTAKE ◽  
Naotake TSUSHIMA
Keyword(s):  
Atomic Force Microscope ◽  
Nanometer Scale ◽  
Mechanical Processing ◽  
Atomic Force ◽  
Muscovite Mica

Spm Based Lithography for Nanometer Scale Electrodes Fabrication

1999 ◽  
Vol 584 ◽  
Author(s):  
A. Notargiacomo ◽  
E. Giovine ◽  
E. Cianci ◽  
V. Foglietti ◽  
F. Evangelisti
Keyword(s):  
Atomic Force Microscope ◽  
Material Removal ◽  
Low Cost ◽  
Metal Electrode ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Quantum Devices ◽  
Positioning Accuracy ◽  
Atomic Force ◽  
Local Oxidation

AbstractScanning probe assisted nanolithography is a very attractive technique in terms of low-cost, patterning resolution and positioning accuracy. Our approach makes use of a commercial atomic force microscope and silicon probes to build simple nanostructures, such as metal electrode pairs, for application in novel quantum devices.Sub-100 nm patterning was successfully performed using three different techniques: direct material removal, scanning probe assisted mask patterning and local oxidation.

Fabrication of nanometer‐scale structures using atomic force microscope with conducting probe

1994 ◽  
Vol 12 (4) ◽  
pp. 2586-2590 ◽  
Author(s):  
Takeo Hattori ◽  
Yasunori Ejiri ◽  
Kenji Saito ◽  
Masatoshi Yasutake
Keyword(s):  
Atomic Force Microscope ◽  
Nanometer Scale ◽  
Atomic Force ◽  
Scale Structures
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