Resolution and LWR improvements by acid diffusion control in EUV lithography

2009 ◽  
Author(s):  
Hideaki Tsubaki ◽  
Tooru Tsuchihashi ◽  
Tomotaka Tsuchimura
Keyword(s):  
Diffusion Control ◽  
Acid Diffusion ◽  
Euv Lithography

Enhanced Acid Diffusion Control by Using Photoacid Generator Bound Polymer Resist

2015 ◽  
Vol 15 (2) ◽  
pp. 1764-1766 ◽  
Author(s):  
Jin Hyuck Jung ◽  
Min Jeong Kim ◽  
Kyung Hwa Sohn ◽  
Ha Na Kang ◽  
Man Kyu Kang ◽  
...  
Keyword(s):  
Diffusion Control ◽  
Acid Diffusion ◽  
Photoacid Generator

Acid diffusion control in chemically amplified resists

Polymer ◽  
1999 ◽  
Vol 40 (4) ◽  
pp. 1087-1089 ◽  
Author(s):  
Jin-Baek Kim ◽  
Jae-Hak Choi ◽  
Young-Gil Kwon ◽  
Min-Ho Jung ◽  
Kyeong-Ho Chang
Keyword(s):  
Diffusion Control ◽  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Inhibition Effects of Some Organic Compounds on Zinc Corrosion in 3.5% NaCl

2008 ◽  
Vol 59 (5) ◽  
Author(s):  
Viorel Branzoi ◽  
Alina Pruna ◽  
Florina Branzoi
Keyword(s):  
Organic Compounds ◽  
Electrochemical Impedance ◽  
Corrosion Process ◽  
Diffusion Control ◽  
Cathodic Reaction ◽  
Zinc Electrode ◽  
Electrochemical Studies ◽  
Nacl Solution ◽  
Sodium Dodecylsulphate ◽  
Zinc Corrosion

The inhibition of zinc corrosion in 3.5% NaCl solution by some organic compounds (sodium dodecylsulphate (SDS), sodium dodecylbenzosulphonate (SDBS) and sodium 1,4-bis(2-etylhexyl) sulphosuccinate (AOT)) was investigated. The inhibition efficiencies were determined by polarization measurements of the zinc electrode in the solution. Electrochemical impedance spectroscopy (EIS) was also used for electrochemical studies of zinc electrode in this medium. The results showed that the used surfactants inhibit the cathodic reaction of hydrogen evolution and at low anodic overvoltage the corrosion process is under activation control, while at high anodic overvoltage the process is under diffusion control.

Status of the liquid-xenon-jet laser-plasma source for EUV lithography

2002 ◽  
Author(s):  
Bjoern A. M. Hansson ◽  
Lars Rymell ◽  
Magnus Berglund ◽  
Oscar E. Hemberg ◽  
Emmanuelle Janin ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Plasma Source ◽  
Liquid Xenon ◽  
Euv Lithography

ChemInform Abstract: In the Blind Spot of Diffusion Control: 2-Fluoroallyl Cations and Their Various Possibilities for Stabilization.

ChemInform ◽  
2010 ◽  
Vol 22 (37) ◽  
pp. no-no
Author(s):  
Y. BESSIERE ◽  
Y. BESSARD ◽  
T. KOTANI ◽  
M. SCHLOSSER
Keyword(s):  
Blind Spot ◽  
Diffusion Control
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