Characterization and optimization of residual layer thickness during UV imprint process for singlemode waveguide fabrication

2009 ◽  
Author(s):  
Shinmo An ◽  
Hyun-Shik Lee ◽  
Se-Guen Park ◽  
Beom-Hoan O ◽  
Seung-Gol Lee ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Residual Layer ◽  
Waveguide Fabrication

Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation

2008 ◽  
Vol 85 (5-6) ◽  
pp. 846-849 ◽  
Author(s):  
Nikolaos Kehagias ◽  
Vincent Reboud ◽  
Clivia M. Sotomayor Torres ◽  
Vadim Sirotkin ◽  
Alexander Svintsov ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Residual Layer ◽  
Coarse Grain

Effect of initial resist thickness on residual layer thickness of nanoimprinted structures

2005 ◽  
Vol 23 (6) ◽  
pp. 3023 ◽  
Author(s):  
Hae-Jeong Lee ◽  
Hyun Wook Ro ◽  
Christopher L. Soles ◽  
Ronald L. Jones ◽  
Eric K. Lin ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Residual Layer

Controlled airbrush coating of polymer resists in Roll-to-Roll nanoimprinting with regimented residual layer thickness

2016 ◽  
Vol 17 (7) ◽  
pp. 943-947 ◽  
Author(s):  
Sungkwan Koo ◽  
Sung Ho Lee ◽  
Jeong Dae Kim ◽  
Jung Goo Hong ◽  
Hyoung Won Baac ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Residual Layer ◽  
Roll To Roll

Simulation of Nanoimprint Based on PSQ-L Polymer

2014 ◽  
Vol 609-610 ◽  
pp. 1498-1502
Author(s):  
Xin Guo ◽  
Ming Zhu Sun ◽  
Ming Shan Zhao ◽  
Xin Zhao
Keyword(s):  
Finite Element Method ◽  
Finite Element ◽  
Layer Thickness ◽  
Liquid Flow ◽  
Static Model ◽  
Simulation System ◽  
Flow Process ◽  
Static State ◽  
Simulation Process ◽  
Waveguide Fabrication

A method of simulating nanoimprint process dynamically is proposed and a software program has been made to complete the simulation process automatically. Finite element method (FEM) is used to reveal mechanism of how the liquid flow in the imprint process by every static state. By means of static model iteration,we make a software to simulate the flow process dynamically and it can be used to forecast the result of the nanoimprint. The simulation system is used to predict residual layer thickness in the waveguide fabrication process.

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