Effect of initial resist thickness on residual layer thickness of nanoimprinted structures

2005 ◽  
Vol 23 (6) ◽  
pp. 3023 ◽  
Author(s):  
Hae-Jeong Lee ◽  
Hyun Wook Ro ◽  
Christopher L. Soles ◽  
Ronald L. Jones ◽  
Eric K. Lin ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Residual Layer

Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation

2008 ◽  
Vol 85 (5-6) ◽  
pp. 846-849 ◽  
Author(s):  
Nikolaos Kehagias ◽  
Vincent Reboud ◽  
Clivia M. Sotomayor Torres ◽  
Vadim Sirotkin ◽  
Alexander Svintsov ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Residual Layer ◽  
Coarse Grain

Controlled airbrush coating of polymer resists in Roll-to-Roll nanoimprinting with regimented residual layer thickness

2016 ◽  
Vol 17 (7) ◽  
pp. 943-947 ◽  
Author(s):  
Sungkwan Koo ◽  
Sung Ho Lee ◽  
Jeong Dae Kim ◽  
Jung Goo Hong ◽  
Hyoung Won Baac ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Residual Layer ◽  
Roll To Roll

Characterization and optimization of residual layer thickness during UV imprint process for singlemode waveguide fabrication

2009 ◽  
Author(s):  
Shinmo An ◽  
Hyun-Shik Lee ◽  
Se-Guen Park ◽  
Beom-Hoan O ◽  
Seung-Gol Lee ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Residual Layer ◽  
Waveguide Fabrication

The Effect of Substrate Deformation in UV-Nanoimprint Lithography Using a Large Area Stamp

2007 ◽  
Vol 121-123 ◽  
pp. 649-652
Author(s):  
Ki Don Kim ◽  
Young Suk Sim ◽  
Jun Ho Jeong ◽  
Hyun Kee Sohn ◽  
Eung Sug Lee ◽  
...  
Keyword(s):  
Finite Element Method ◽  
Finite Element ◽  
Layer Thickness ◽  
Nanoimprint Lithography ◽  
Residual Layer ◽  
Simplified Model ◽  
Large Area ◽  
Severe Deformation ◽  
Element Method

We investigated the non-uniformity of the residual layer thickness caused by wafer deformation in an experiment that examined different wafer thicknesses using UV-NIL with an element-wise patterned stamp (EPS). Experiments using the EPS were performed on an EVG®620-NIL. Severe deformation of the wafer served as an obstacle to the spread of resin drops, which caused non-uniformity of the residual layer thickness. We also simulated the imprint process using a simplified model and finite element method to analyze the non-uniformity.

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