Challenges of 29nm half-pitch NAND Flash STI patterning with 193nm dry lithography and self-aligned double patterning
2012 ◽
Vol E95.C
(5)
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pp. 837-841
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2020 ◽
Vol E103.C
(4)
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pp. 171-180
2016 ◽
Vol E99.C
(2)
◽
pp. 293-301
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2013 ◽
Vol E96.A
(12)
◽
pp. 2645-2651
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