Deposition of nanocrystalline SiC films using helicon wave plasma enhanced chemical vapor deposition

Low temperature deposition of hydrogenated nanocrystalline SiC films by helicon wave plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3478675 ◽

2010 ◽

Vol 28 (5) ◽

pp. 1234-1239 ◽

Cited By ~ 5

Author(s):

Wei Yu ◽

Wanbing Lu ◽

Xiaoyun Teng ◽

Wenge Ding ◽

Li Han ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Deposition ◽

Helicon Wave ◽

Temperature Deposition ◽

Sic Films ◽

Helicon Wave Plasma

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Effect of radio frequency bias on the optical and structural properties of nanocrystalline SiC films deposited by helicon wave plasma enhanced chemical vapor deposition

10.1117/12.635142 ◽

2005 ◽

Author(s):

Wei Yu ◽

Chunsheng Wang ◽

Wanbing Lu ◽

Shuangkui Cui ◽

Guangsheng Fu

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Helicon Wave ◽

Sic Films ◽

Helicon Wave Plasma

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Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.l1348 ◽

1996 ◽

Vol 35 (Part 2, No. 10B) ◽

pp. L1348-L1350 ◽

Cited By ~ 5

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi ◽

Yoshihisa Matsubara

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gap Filling ◽

Helicon Wave ◽

Carbon Thin Films ◽

Helicon Wave Plasma

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The properties of N-doped diamond-like carbon films prepared by helicon wave plasma chemical vapor deposition

Plasma Science and Technology ◽

10.1088/2058-6272/aaee90 ◽

2018 ◽

Vol 21 (2) ◽

pp. 025502

Author(s):

Jiali CHEN ◽

Peiyu JI ◽

Chenggang JIN ◽

Lanjian ZHUGE ◽

Xuemei WU

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

Helicon Wave Plasma

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Preparation of cubic boron nitride thin film by the helicon wave plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.117858 ◽

1996 ◽

Vol 69 (26) ◽

pp. 4023-4025 ◽

Cited By ~ 6

Author(s):

Seon‐Hyo Kim ◽

Ig‐Hyeon Kim ◽

Ki‐Sung Kim

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Helicon Wave ◽

Helicon Wave Plasma

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Characterization of boron nitride film synthesized by helicon wave plasma-assisted chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00248-4 ◽

2000 ◽

Vol 9 (1) ◽

pp. 67-72 ◽

Cited By ~ 3

Author(s):

Kyoung-Bo Kim ◽

Seon-Hyo Kim

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nitride Film ◽

Helicon Wave ◽

Helicon Wave Plasma

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Fast preparation of vertical graphene nanosheets by helicon wave plasma chemical vapor deposition and its electrochemical performance

Diamond and Related Materials ◽

10.1016/j.diamond.2020.107958 ◽

2020 ◽

Vol 108 ◽

pp. 107958 ◽

Cited By ~ 1

Author(s):

Peiyu Ji ◽

Jiali Chen ◽

Tianyuan Huang ◽

Chenggang Jin ◽

Lanjian Zhuge ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrochemical Performance ◽

Vapor Deposition ◽

Graphene Nanosheets ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

Helicon Wave Plasma

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Adhesion improvement of cubic BN:C film synthesized by a helicon wave plasma chemical vapor deposition process

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582273 ◽

2000 ◽

Vol 18 (3) ◽

pp. 900-906 ◽

Cited By ~ 8

Author(s):

Kyoung-Bo Kim ◽

Seon-Hyo Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

Vapor Deposition Process ◽

Helicon Wave Plasma

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Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma Enhanced Chemical Vapor Deposition

10.7567/ssdm.1996.sympo.ii-11 ◽

1996 ◽

Author(s):

Kazuhiko ENDO ◽

Toru TATSUMI

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gap Filling ◽

Helicon Wave ◽

Carbon Thin Films ◽

Helicon Wave Plasma

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Epitaxial Growth Of GaN By HWP(Helicon Wave Plasma) Assisted Metal-Organic CVD (Chemical Vapor Deposition) Process

Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135) ◽

10.1109/imnc.1998.730059 ◽

1998 ◽

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Helicon Wave ◽

Metal Organic ◽

Vapor Deposition Process ◽

Helicon Wave Plasma

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