Effect of radio frequency bias on the optical and structural properties of nanocrystalline SiC films deposited by helicon wave plasma enhanced chemical vapor deposition

Mapping Intimacies ◽

10.1117/12.635142 ◽

2005 ◽

Author(s):

Wei Yu ◽

Chunsheng Wang ◽

Wanbing Lu ◽

Shuangkui Cui ◽

Guangsheng Fu

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Helicon Wave ◽

Sic Films ◽

Helicon Wave Plasma

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Low temperature deposition of hydrogenated nanocrystalline SiC films by helicon wave plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3478675 ◽

2010 ◽

Vol 28 (5) ◽

pp. 1234-1239 ◽

Cited By ~ 5

Author(s):

Wei Yu ◽

Wanbing Lu ◽

Xiaoyun Teng ◽

Wenge Ding ◽

Li Han ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Deposition ◽

Helicon Wave ◽

Temperature Deposition ◽

Sic Films ◽

Helicon Wave Plasma

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Deposition of nanocrystalline SiC films using helicon wave plasma enhanced chemical vapor deposition

10.1117/12.803081 ◽

2008 ◽

Author(s):

Wanbing Lu ◽

Wei Yu ◽

Luo Ma ◽

Liping Wu ◽

Guangsheng Fu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Helicon Wave ◽

Sic Films ◽

Helicon Wave Plasma

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Effect of Bias Addition on the Gap-Filling Properties of Fluorinated Amorphous Carbon Thin Films Grown by Helicon Wave Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.l1348 ◽

1996 ◽

Vol 35 (Part 2, No. 10B) ◽

pp. L1348-L1350 ◽

Cited By ~ 5

Author(s):

Kazuhiko Endo ◽

Toru Tatsumi ◽

Yoshihisa Matsubara

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gap Filling ◽

Helicon Wave ◽

Carbon Thin Films ◽

Helicon Wave Plasma

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Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Applied Surface Science ◽

10.1016/j.apsusc.2011.05.112 ◽

2011 ◽

Vol 257 (23) ◽

pp. 9717-9723 ◽

Cited By ~ 24

Author(s):

Sumita Mukhopadhyay ◽

Swati Ray

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Electronic and structural properties of doped amorphous and nanocrystalline silicon deposited at low substrate temperatures by radio-frequency plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1586275 ◽

2003 ◽

Vol 21 (4) ◽

pp. 1048-1054 ◽

Cited By ~ 28

Author(s):

P. Alpuim ◽

V. Chu ◽

J. P. Conde

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Substrate Temperatures ◽

Electronic And Structural Properties

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The properties of N-doped diamond-like carbon films prepared by helicon wave plasma chemical vapor deposition

Plasma Science and Technology ◽

10.1088/2058-6272/aaee90 ◽

2018 ◽

Vol 21 (2) ◽

pp. 025502

Author(s):

Jiali CHEN ◽

Peiyu JI ◽

Chenggang JIN ◽

Lanjian ZHUGE ◽

Xuemei WU

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

Helicon Wave Plasma

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Preparation of cubic boron nitride thin film by the helicon wave plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.117858 ◽

1996 ◽

Vol 69 (26) ◽

pp. 4023-4025 ◽

Cited By ~ 6

Author(s):

Seon‐Hyo Kim ◽

Ig‐Hyeon Kim ◽

Ki‐Sung Kim

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Helicon Wave ◽

Helicon Wave Plasma

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Characterization of boron nitride film synthesized by helicon wave plasma-assisted chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00248-4 ◽

2000 ◽

Vol 9 (1) ◽

pp. 67-72 ◽

Cited By ~ 3

Author(s):

Kyoung-Bo Kim ◽

Seon-Hyo Kim

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nitride Film ◽

Helicon Wave ◽

Helicon Wave Plasma

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Fast preparation of vertical graphene nanosheets by helicon wave plasma chemical vapor deposition and its electrochemical performance

Diamond and Related Materials ◽

10.1016/j.diamond.2020.107958 ◽

2020 ◽

Vol 108 ◽

pp. 107958 ◽

Cited By ~ 1

Author(s):

Peiyu Ji ◽

Jiali Chen ◽

Tianyuan Huang ◽

Chenggang Jin ◽

Lanjian Zhuge ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrochemical Performance ◽

Vapor Deposition ◽

Graphene Nanosheets ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

Helicon Wave Plasma

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Adhesion improvement of cubic BN:C film synthesized by a helicon wave plasma chemical vapor deposition process

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582273 ◽

2000 ◽

Vol 18 (3) ◽

pp. 900-906 ◽

Cited By ~ 8

Author(s):

Kyoung-Bo Kim ◽

Seon-Hyo Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

Vapor Deposition Process ◽

Helicon Wave Plasma

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