Plasma enhanced chemical vapor deposition of high refractive index polymer films

2008 ◽  
Author(s):  
Jesse O. Enlow ◽  
Hao Jiang ◽  
Kurt G. Eyink ◽  
John T. Grant ◽  
Weijie Su ◽  
...  
Keyword(s):  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Refractive Index

Highly Tm Doped Silica Optical Preform by MCVD - Chelate Vapor Delivery (Soot-Dopant Stepwise Technique)

2018 ◽  
Vol 780 ◽  
pp. 57-61 ◽  
Author(s):  
K.A. Mat-Sharif ◽  
Nasr Y.M. Omar ◽  
M.I. Zulkifli ◽  
S.Z. Muhd-Yassin ◽  
Y.K. Sin ◽  
...  
Keyword(s):  
Refractive Index ◽  
Absorption Spectrum ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Absorption Peak ◽  
Strong Absorption ◽  
Silica Fiber ◽  
Index Variation ◽  
Strong Absorption Peak

This paper presents the progress in the fabrication of highly doped thulium silica fiber. As much as 5.3 wt. % Tm alongside 7.1 wt. % Al (co-dopant) were incorporated into silica preform. The preform was fabricated using the Modified Chemical Vapor Deposition (MCVD)-chelate vapor delivery with soot-dopant stepwise technique. The preform was analyzed for several key properties such as refractive index variation along deposition length, dopants distribution profiles and UV-Vis absorption. The results showed a homogeneous dopants distribution with 4% RSD in the longitudinal refractive index along a 40 cm preform length. The UV-Vis absorption spectrum exhibited a strong absorption peak at 790 nm attributed to Tm 3H4 energy manifold.

SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition

2006 ◽  
Vol 500 (1-2) ◽  
pp. 19-26 ◽  
Author(s):  
F. Gracia ◽  
F. Yubero ◽  
J.P. Holgado ◽  
J.P. Espinos ◽  
A.R. Gonzalez-Elipe ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Tio2 Thin Films

Refractive index of III-metal-polar and N-polar AlGaN waveguides grown by metal organic chemical vapor deposition

2013 ◽  
Vol 102 (22) ◽  
pp. 221106 ◽  
Author(s):  
Martin Rigler ◽  
Marko Zgonik ◽  
Marc P. Hoffmann ◽  
Ronny Kirste ◽  
Milena Bobea ◽  
...  
Keyword(s):  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

A Basic Monte Carlo Model of Initiated Chemical Vapor Deposition Using Kinetic Theory

2014 ◽  
Vol 1704 ◽  
Author(s):  
Hayley R. Osman ◽  
Saibal Mitra
Keyword(s):  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Monte Carlo Model ◽  
Chemical Vapor ◽  
Reaction Chamber ◽  
Initial Growth ◽  
Time Step ◽  
Initiated Chemical Vapor Deposition

ABSTRACTInitiated Chemical Vapor Deposition (iCVD) is a well-known method for depositing polymers that are used in chemical, biological, and electrical applications. It is a variation of hot filament deposition and can used to produce conformal coatings of polymer films at relatively low reaction temperatures. It is also a solventless technique in which thin polymeric films are deposited by introducing controlled ratios of monomer and initiator gasses into the reaction chamber. Low temperatures in the reaction chamber allow the deposition of polymer films on a wide variety of substrates that include biological substrates.We have simulated the growth of a monolayer of polymer films on two-dimensional surfaces using Monte Carlo simulation. We saw the formation of polymer chains over a time scale on the order of microseconds. We have assumed the substrate to be at room temperature while the reactor pressure close of 800 mTorr.The grid on which we have simulated this polymer growth is represented by a 100x100 matrix, on which a series of specialized functions are executed in each time-step, or iteration. These functions can be divided into three categories: population, translation, and polymerization.The goal of this simulation is to observe the initial growth of the iCVD surface reaction. We have obtained favorable results with the simulation and we are now looking to compare these results with experimental results for initiation growth.

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