Refractive index of III-metal-polar and N-polar AlGaN waveguides grown by metal organic chemical vapor deposition

2013 ◽  
Vol 102 (22) ◽  
pp. 221106 ◽  
Author(s):  
Martin Rigler ◽  
Marko Zgonik ◽  
Marc P. Hoffmann ◽  
Ronny Kirste ◽  
Milena Bobea ◽  
...  
Keyword(s):  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

A Drastic Change in Structure and Property of TiO2 Thin Films Deposited by Metal-Organic Chemical Vapor Deposition With Deposition Temperature

2000 ◽  
Vol 616 ◽  
Author(s):  
Jeong-Hoon Park ◽  
Woon-Jo Cho ◽  
Kug-Sun Hong
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Deposition Temperature ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

AbstractTiO2 thin films were deposited by metal-organic chemical vapor deposition (MOCVD) method using titanium tetraisopropoxide(TTIP). A drastic change in structural aspect and its property occurred when the deposition temperature increased above 400°C. Deposition kinetics was proved to transit from reaction controlled regime into diffusion controlled regime above about 400°C in Arrehnius plot. In X-ray diffraction (XRD)and infrared reflectance spectra, it was observed that the crystallinity was decreased significantly around 400°C. The surface microstructure has changed explicitly from dense structure with larger grains to porous one with smaller grains observed by scanning electron microscopy and transmission electron microscopy. Electrical resistance of the films jumped by 2 orders of magnitude, which is measured by the 4-point probe method. The refractive index calculated by Swanepoel's method has decreased from 2.45 to 2.28 at 630nm. The porous microstructure of films deposited at above 400°C was thought to be responsible for the significant decrease in electrical conductivity and refractive index of the films.

Substrate Effects on the Structure and Optical Properties of Epitaxial PbTiO3 Thin Films Prepared by Metal-Organic Chemical Vapor Deposition

1994 ◽  
Vol 341 ◽  
Author(s):  
C. M. Foster ◽  
Z. Li ◽  
G. R. Bai ◽  
H. You ◽  
D. Guo ◽  
...  
Keyword(s):  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Refractive Indices ◽  
Bulk Single Crystal ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

AbstractEpitaxial PbTiOM3 films were prepared by metal-organic chemical vapor deposition (MOCVD) on MgO(001), SrTiO3 (001) and LaAlO3 (001) surfaces. Four-circle X-ray diffraction and optical waveguiding experiments were performed to characterize the deposited films. The films on all three substrates were single-crystal; however, the domain structure of the films was strongly dependent on the substrate material. Films on MgO and LaAlO3 substrates showed a large amount of 90° domain structures, whereas, the degree of twinning was greatly suppressed for films on SrTiO3. The refractive indices and optical birefringence of the films were measured as a function of wavelength using the film-prism coupling method. We found that for films on LaAlO3 (001), the ordinary index and for films on MgO(001) both the ordinary and extraordinary refractive indices were higher than those of bulk single-crystal PbTiO3. For films grown on SrTiO3 (001), the ordinary refractive index was very close to that of single crystal PbTiO3. We correlate the increased refractive index and the reduced birefringence to the degree of epitaxial strain and twinning in the samples, respectively.

scholarly journals Laser‐Assisted Metal–Organic Chemical Vapor Deposition of Gallium Nitride

2021 ◽  
Vol 15 (6) ◽  
pp. 2170024
Author(s):  
Yuxuan Zhang ◽  
Zhaoying Chen ◽  
Kaitian Zhang ◽  
Zixuan Feng ◽  
Hongping Zhao
Keyword(s):  
Gallium Nitride ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

scholarly journals Growth-Etch Metal–Organic Chemical Vapor Deposition Approach of WS2 Atomic Layers

ACS Nano ◽  
2020 ◽  
Author(s):  
Assael Cohen ◽  
Avinash Patsha ◽  
Pranab K. Mohapatra ◽  
Miri Kazes ◽  
Kamalakannan Ranganathan ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Vertical β-Ga2O3 field plate Schottky barrier diode from metal-organic chemical vapor deposition

2021 ◽  
Vol 118 (16) ◽  
pp. 162109
Author(s):  
Esmat Farzana ◽  
Fikadu Alema ◽  
Wan Ying Ho ◽  
Akhil Mauze ◽  
Takeki Itoh ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Schottky Barrier ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Schottky Barrier Diode ◽  
Organic Chemical ◽  
Field Plate ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition
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