Determination of carrier mobility of amorphous organic electronic material by thin film transistor configuration

2008 ◽  
Author(s):  
C. H. Cheung ◽  
K. K. Tsung ◽  
S. K. So
1990 ◽  
Vol 2 (12) ◽  
pp. 592-594 ◽  
Author(s):  
Francis Garnier ◽  
Gilles Horowitz ◽  
Xuezhou Peng ◽  
Denis Fichou

2017 ◽  
Vol 28 (17) ◽  
pp. 175201 ◽  
Author(s):  
Hyunsuk Woo ◽  
Taeho Kim ◽  
Jihyun Hur ◽  
Sanghun Jeon

2003 ◽  
Vol 769 ◽  
Author(s):  
I-Chun Cheng ◽  
Steven Allen ◽  
Sigurd Wagner

AbstractThin film transistors of nanocrystalline silicon (nc-Si:H) are made in the staggered topgate, bottom-source/drain geometry. To achieve both high carrier mobility and low off current, the nc-Si:H channel material must be kept thin but comprise a contiguous 10-nm thick crystalline layer at its top. We study this electrically most interesting top layer of the nc-Si:H channel film by AFM and SEM. Introducing an nc-Si:H seed layer underneath the TFT promotes the structural evolution of the nc-Si:H channel layer and raises the electron field effect mobility up to 40 cm2V-1s-1.


2008 ◽  
Vol 8 (9) ◽  
pp. 4881-4884
Author(s):  
Se Young Oh ◽  
Sun Kak Hwang ◽  
Young Do Kim ◽  
Jong Wook Park ◽  
In Nam Kang

We have fabricated the vertical type organic thin film transistor (OTFT) using electrically conductive poly(3-hexylthiophene) (P3HT) as a p-type organic material. Effects of post thermal annealing and thickness of active layer on the performance of vertical type transistors were investigated. Especially, the correlation between carrier mobility of P3HT after post thermal annealing and static characteristics of the transistor was studied. Carrier mobility was calculated by space charge limited current (SCLC) model from the I–V curves of the prepared device. The vertical type OTFT after post thermal annealing at 120 °C (Tg) showed high current of 0.383 mA and on–off ratio of 22.5 at a low gate voltage of +2.0 V. Additionally, we report on emission characteristics from the vertical type transistor using P3HT.


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