Preliminary verifiability of the aerial image measurement tool over photolithography process

2007 ◽  
Author(s):  
Hyemi Lee ◽  
Goomin Jeong ◽  
Sangchul Kim ◽  
Oscar Han
Keyword(s):  
Aerial Image ◽  
Measurement Tool ◽  
Image Measurement ◽  
Photolithography Process

Actinic aerial image measurement tool for 157-nm mask qualification

2003 ◽  
Author(s):  
Takashi Yasui ◽  
Iwao Higashikawa ◽  
Peter Kuschnerus ◽  
Thomas Engel ◽  
Axel M. Zibold ◽  
...  
Keyword(s):  
Aerial Image ◽  
Measurement Tool ◽  
Image Measurement

Actinic aerial image measurement tool for 157-nm lithography

2003 ◽  
Author(s):  
Peter Kuschnerus ◽  
Thomas Engel ◽  
Axel M. Zibold ◽  
Claudia Hertfelder ◽  
Takashi Yasui ◽  
...  
Keyword(s):  
Aerial Image ◽  
Measurement Tool ◽  
Image Measurement

Application of the aerial image measurement system (AIMS)TM to the analysis of binary mask imaging and resolution enhancement techniques

1994 ◽  
Author(s):  
Ronald M. Martino ◽  
Richard A. Ferguson ◽  
Russell A. Budd ◽  
John L. Staples ◽  
Lars W. Liebmann ◽  
...  
Keyword(s):  
Measurement System ◽  
Resolution Enhancement ◽  
Aerial Image ◽  
Binary Mask ◽  
Image Measurement

Aerial image measurement methods for fast aberration set-up and illumination pupil verification

2001 ◽  
Author(s):  
Hans van der Laan ◽  
Marcel Dierichs ◽  
Henk van Greevenbroek ◽  
Elaine McCoo ◽  
Fred Stoffels ◽  
...  
Keyword(s):  
Measurement Methods ◽  
Aerial Image ◽  
Image Measurement ◽  
Set Up

New mask evaluation tool: the microlithography simulation microscope aerial image measurement system

1994 ◽  
Author(s):  
Russell A. Budd ◽  
Derek B. Dove ◽  
John L. Staples ◽  
H. Nasse ◽  
Wilhelm Ulrich
Keyword(s):  
Measurement System ◽  
Aerial Image ◽  
Evaluation Tool ◽  
Image Measurement

Aerial image measurement technique for fast evaluation of 193-nm lithography masks

2004 ◽  
Author(s):  
Axel M. Zibold ◽  
Thomas Scheruebl ◽  
Wolfgang Harnisch ◽  
Robert Brunner ◽  
J. Greif
Keyword(s):  
Measurement Technique ◽  
Aerial Image ◽  
Image Measurement ◽  
Fast Evaluation ◽  
193 Nm

Aerial image measurement technique for today's and future 193-nm lithography mask requirements

2004 ◽  
Author(s):  
Axel M. Zibold ◽  
Thomas Scheruebl ◽  
Alexander Menck ◽  
Robert Brunner ◽  
J. Greif
Keyword(s):  
Measurement Technique ◽  
Aerial Image ◽  
Image Measurement ◽  
193 Nm
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