A comparison study of tantalum-nitrogen and chromium absorber in extreme ultraviolet mask fabrication using electron-beam lithography simulation

2007 ◽  
Author(s):  
Guorong Zhao ◽  
Yanqiu Li
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Comparison Study ◽  
Lithography Simulation ◽  
Mask Fabrication

Electron Beam Lithography Simulation for the Patterning of Extreme Ultraviolet Masks

2008 ◽  
Vol 47 (6) ◽  
pp. 4909-4912 ◽  
Author(s):  
N. Tsikrikas ◽  
G. P. Patsis ◽  
I. Raptis ◽  
A. Gerardino ◽  
E. Quesnel
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Lithography Simulation

scholarly journals Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography

Nanoscale ◽  
2020 ◽  
Vol 12 (20) ◽  
pp. 11306-11316
Author(s):  
Christian D. Dieleman ◽  
Weiyi Ding ◽  
Lianjia Wu ◽  
Neha Thakur ◽  
Ivan Bespalov ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Luminescent Properties ◽  
Colloidal Quantum Dots ◽  
Direct Patterning ◽  
One Step ◽  
Patterning Technique

A general, one-step patterning technique for colloidal quantum dots by direct optical or e-beam lithography. Photons (5.5–91.9 eV) and electrons (3 eV–50 kV) crosslink and immobilize QDs down to tens of nm while preserving the luminescent properties.

Electron beam lithography simulation for sub-10 nm patterning

2014 ◽  
Vol 53 (6S) ◽  
pp. 06JB02 ◽  
Author(s):  
Katsushi Michishita ◽  
Masaaki Yasuda ◽  
Hiroaki Kawata ◽  
Yoshihiko Hirai
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Lithography Simulation
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