Pattern decomposition for double patterning from photomask viewpoint

2007 ◽  
Author(s):  
Nobuhito Toyama ◽  
Takashi Adachi ◽  
Yuichi Inazuki ◽  
Takanori Sutou ◽  
Yasutaka Morikawa ◽  
...  
Keyword(s):  
Pattern Decomposition ◽  
Double Patterning

Full area pattern decomposition of self-aligned double patterning for 30nm node NAND FLASH process

2010 ◽  
Author(s):  
Yi-Shiang Chang ◽  
Jason Sweis ◽  
Jun-Cheng Lai ◽  
Chia-Chi Lin ◽  
Jonathan Yu
Keyword(s):  
Nand Flash ◽  
Pattern Decomposition ◽  
Double Patterning

Diffraction-based overlay for spacer patterning and double patterning technology

2011 ◽  
Author(s):  
Byoung Hoon Lee ◽  
JeongSu Park ◽  
Jongsu Lee ◽  
Sarohan Park ◽  
ChangMoon Lim ◽  
...  
Keyword(s):  
Double Patterning

Advanced aberration control in projection optics for double patterning

2009 ◽  
Author(s):  
Toshiyuki Yoshihara ◽  
Takashi Sukegawa ◽  
Nobuhiko Yabu ◽  
Masatoshi Kobayashi ◽  
Tadashi Arai ◽  
...  
Keyword(s):  
Double Patterning ◽  
Projection Optics

A lithographic and process assessment of photoresist stabilization for double-patterning using 172-nm photoresist curing

2008 ◽  
Author(s):  
Nikolaos Bekiaris ◽  
Hiram Cervera ◽  
Junyan Dai ◽  
Ryoung-han Kim ◽  
Alden Acheta ◽  
...  
Keyword(s):  
Process Assessment ◽  
Double Patterning

Enabling 35nm double patterning contact imaging using a novel CD shrink process

2008 ◽  
Author(s):  
Yoshiaki Yamada ◽  
Michael M. Crouse ◽  
Shannon Dunn ◽  
Tetsu Kawasaki ◽  
Satoru Shimura ◽  
...  
Keyword(s):  
Double Patterning ◽  
Contact Imaging

Track optimization and control for 32nm node double patterning and beyond

2009 ◽  
Author(s):  
David Laidler ◽  
Craig Rosslee ◽  
Koen D'havé ◽  
Philippe Leray ◽  
Len Tedeschi
Keyword(s):  
Optimization And Control ◽  
Double Patterning ◽  
And Control
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