Nanochannel fabrication based on double patterning with hydrogen silsesquioxane

2015 ◽  
Vol 33 (2) ◽  
pp. 020601
Author(s):  
Kenneth Diest ◽  
Russell Goodman ◽  
Mordechai Rothschild
Keyword(s):  
Hydrogen Silsesquioxane ◽  
Double Patterning

Diffraction-based overlay for spacer patterning and double patterning technology

2011 ◽  
Author(s):  
Byoung Hoon Lee ◽  
JeongSu Park ◽  
Jongsu Lee ◽  
Sarohan Park ◽  
ChangMoon Lim ◽  
...  
Keyword(s):  
Double Patterning

scholarly journals Contrast enhancement behavior of hydrogen silsesquioxane in a salty developer

2009 ◽  
Vol 27 (6) ◽  
pp. 2635 ◽  
Author(s):  
Sung-Wook Nam ◽  
Michael J. Rooks ◽  
Joel K. W. Yang ◽  
Karl K. Berggren ◽  
Hyun-Mi Kim ◽  
...  
Keyword(s):  
Contrast Enhancement ◽  
Hydrogen Silsesquioxane

Advanced aberration control in projection optics for double patterning

2009 ◽  
Author(s):  
Toshiyuki Yoshihara ◽  
Takashi Sukegawa ◽  
Nobuhiko Yabu ◽  
Masatoshi Kobayashi ◽  
Tadashi Arai ◽  
...  
Keyword(s):  
Double Patterning ◽  
Projection Optics

scholarly journals Nanopatterning in a compact setup using table top extreme ultraviolet lasers

2008 ◽  
Vol 16 (4) ◽  
Author(s):  
P. Wachulak ◽  
M. Capeluto ◽  
C. Menoni ◽  
J. Rocca ◽  
M. Marconi
Keyword(s):  
Extreme Ultraviolet ◽  
Laser Pulses ◽  
Hydrogen Silsesquioxane ◽  
Time Duration ◽  
Interferometric Lithography ◽  
Euv Lasers ◽  
Extreme Ultraviolet Lasers ◽  
New Applications ◽  
Compact Sources ◽  
Discharge Laser

AbstractThe recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to nanotechnology and nanofabrication. In this paper we review the advances in the utilization of EUV lasers in nanopatterning. In particular we show results of the nanopatterning using a table-top capillary discharge laser producing 0.12-mJ laser pulses with 1.2-ns time duration at a wavelength λ = 46.9 nm. The nanopatterning was realized by interferometric lithography using a Lloyd’s mirror interferometer. Two standard photoresists were used in this work, polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ). Pillars with a full width half maximum (FWHM) diameter of 60 nm and holes with FWHM diameter of 130 nm were obtained over areas in excess of 500×500 μm2.

Synthesis of Hierarchically Porous Hydrogen Silsesquioxane Monoliths and Embedding of Metal Nanoparticles by On-Site Reduction

2012 ◽  
Vol 23 (21) ◽  
pp. 2714-2722 ◽  
Author(s):  
Nirmalya Moitra ◽  
Kazuyoshi Kanamori ◽  
Toyoshi Shimada ◽  
Kazuyuki Takeda ◽  
Yumi H. Ikuhara ◽  
...  
Keyword(s):  
Metal Nanoparticles ◽  
Hydrogen Silsesquioxane ◽  
Hierarchically Porous
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