Laser direct writing of inorganic-organic hybrid polymeric channel waveguide for optical integrated circuits

Author(s):  
Shuping Wang ◽  
Brad Borden ◽  
Ye Li ◽  
Prakhar Goel
Nanomaterials ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 910 ◽  
Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  

In this paper, we develop a technique for realizing multi-centimeter-long lithium niobate on insulator (LNOI) waveguides with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides was determined with an atomic force microscope to be 0.452 nm. The approach is compatible with other surface patterning technologies, such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.


2016 ◽  
Vol 2 (11) ◽  
pp. e1601574 ◽  
Author(s):  
Xiao Dai ◽  
Jiang Wu ◽  
Zhicheng Qian ◽  
Haiyan Wang ◽  
Jie Jian ◽  
...  

Large-area graphene thin films are prized in flexible and transparent devices. We report on a type of glassy graphene that is in an intermediate state between glassy carbon and graphene and that has high crystallinity but curly lattice planes. A polymer-assisted approach is introduced to grow an ultra-smooth (roughness, <0.7 nm) glassy graphene thin film at the inch scale. Owing to the advantages inherited by the glassy graphene thin film from graphene and glassy carbon, the glassy graphene thin film exhibits conductivity, transparency, and flexibility comparable to those of graphene, as well as glassy carbon–like mechanical and chemical stability. Moreover, glassy graphene–based circuits are fabricated using a laser direct writing approach. The circuits are transferred to flexible substrates and are shown to perform reliably. The glassy graphene thin film should stimulate the application of flexible transparent conductive materials in integrated circuits.


Nanophotonics ◽  
2020 ◽  
Vol 9 (8) ◽  
pp. 2495-2503 ◽  
Author(s):  
Qingyu Tian ◽  
Peng Yin ◽  
Teng Zhang ◽  
Lunbin Zhou ◽  
Bin Xu ◽  
...  

AbstractWe report on an Er:Y2O3 ceramic channel waveguide laser operating at continuous-wave and passively Q-switched regimes, for the first time to the best of our knowledge. The Er:Y2O3 ceramic channel waveguide has been fabricated by a femtosecond laser direct-writing technique. The maximum output power reached 123.5 mW in continuous-wave mode with a slope efficiency of about 21%, and the lasing behavior has been found simultaneously at 2710.28, 2716.76, and 2723.18 nm. We have further fabricated an MXene Ti3C2Tx saturable absorber mirror to operate the Er:Y2O3 waveguide in passively Q-switched regime. At the same time, property of the MXene Ti3C2Tx saturable absorber has been characterized, and nonlinear saturable absorption of the saturable absorber has also been measured. The average output power is about 67.6 mW, and the shortest pulse width is about 58.1 ns. This work indicates that femtosecond laser direct writing is a reliable technique for processing mid-infrared ceramic waveguides, and MXene Ti3C2Tx is promising for operating pulsed mid-infrared lasers.


Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  

We develop a technique for realizing lithium niobate on insulator (LNOI) waveguides of a multi-centimeter-length with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium (Cr) thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by the chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides is determined to be 0.452 nm with an atomic force microscope (AFM). The approach is compatible with other surface patterning technologies such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.


2000 ◽  
Vol 624 ◽  
Author(s):  
D. J. Ehrlich ◽  
Richard Aucoin ◽  
M. J. Burns ◽  
Kenneth Nill ◽  
Scott Silverman

ABSTRACTLaser microchemical direct write deposition and etching methods have found an essential niche in debug and design for yield of wire-bonded and flip-chip integrated circuits. Future applications should develop in package-level system modification.


1987 ◽  
Vol 50 (15) ◽  
pp. 1016-1018 ◽  
Author(s):  
Jerry G. Black ◽  
Scott P. Doran ◽  
Mordechai Rothschild ◽  
Daniel J. Ehrlich

2021 ◽  
Vol 61 ◽  
pp. 102427
Author(s):  
Xiaoyan Sun ◽  
Zikun Chang ◽  
Li Zeng ◽  
Xinran Dong ◽  
Youwang Hu ◽  
...  

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