Supplemental multilevel interconnects by laser direct writing: Application to GaAs digital integrated circuits

1987 ◽  
Vol 50 (15) ◽  
pp. 1016-1018 ◽  
Author(s):  
Jerry G. Black ◽  
Scott P. Doran ◽  
Mordechai Rothschild ◽  
Daniel J. Ehrlich
Keyword(s):  
Integrated Circuits ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Digital Integrated Circuits

scholarly journals Long Low-Loss-Litium Niobate on Insulator Waveguides with Sub-Nanometer Surface Roughness

Nanomaterials ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 910 ◽  
Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Integrated Circuits ◽  
Large Scale ◽  
Photonic Integrated Circuits ◽  
Surface Patterning ◽  
Propagation Loss ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Low Loss ◽  
Atomic Force

In this paper, we develop a technique for realizing multi-centimeter-long lithium niobate on insulator (LNOI) waveguides with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides was determined with an atomic force microscope to be 0.452 nm. The approach is compatible with other surface patterning technologies, such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.

scholarly journals Ultra-smooth glassy graphene thin films for flexible transparent circuits

2016 ◽  
Vol 2 (11) ◽  
pp. e1601574 ◽  
Author(s):  
Xiao Dai ◽  
Jiang Wu ◽  
Zhicheng Qian ◽  
Haiyan Wang ◽  
Jie Jian ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Integrated Circuits ◽  
Glassy Carbon ◽  
Flexible Substrates ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Large Area ◽  
Conductive Materials ◽  
Lattice Planes

Large-area graphene thin films are prized in flexible and transparent devices. We report on a type of glassy graphene that is in an intermediate state between glassy carbon and graphene and that has high crystallinity but curly lattice planes. A polymer-assisted approach is introduced to grow an ultra-smooth (roughness, <0.7 nm) glassy graphene thin film at the inch scale. Owing to the advantages inherited by the glassy graphene thin film from graphene and glassy carbon, the glassy graphene thin film exhibits conductivity, transparency, and flexibility comparable to those of graphene, as well as glassy carbon–like mechanical and chemical stability. Moreover, glassy graphene–based circuits are fabricated using a laser direct writing approach. The circuits are transferred to flexible substrates and are shown to perform reliably. The glassy graphene thin film should stimulate the application of flexible transparent conductive materials in integrated circuits.

scholarly journals Low-Loss Lithium Niobate on Insulator (LNOI) Waveguides of a 10 cm-Length and a Sub-Nanometer Surface Roughness

2018 ◽  
Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Lithium Niobate ◽  
Integrated Circuits ◽  
Large Scale ◽  
Photonic Integrated Circuits ◽  
Propagation Loss ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Low Loss ◽  
Atomic Force

We develop a technique for realizing lithium niobate on insulator (LNOI) waveguides of a multi-centimeter-length with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium (Cr) thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by the chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides is determined to be 0.452 nm with an atomic force microscope (AFM). The approach is compatible with other surface patterning technologies such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.

Real-World Applications of Laser Direct Writing

2000 ◽  
Vol 624 ◽  
Author(s):  
D. J. Ehrlich ◽  
Richard Aucoin ◽  
M. J. Burns ◽  
Kenneth Nill ◽  
Scott Silverman
Keyword(s):  
Integrated Circuits ◽  
Real World ◽  
Flip Chip ◽  
Direct Write ◽  
Direct Writing ◽  
Level System ◽  
Laser Direct Writing ◽  
Real World Applications ◽  
Design For Yield

ABSTRACTLaser microchemical direct write deposition and etching methods have found an essential niche in debug and design for yield of wire-bonded and flip-chip integrated circuits. Future applications should develop in package-level system modification.

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