Very low dislocation density AlN substrates for device applications

2006 ◽  
Author(s):  
Sandra B. Schujman ◽  
Leo J. Schowalter ◽  
Wayne Liu ◽  
Joseph Smart
Keyword(s):  
Dislocation Density ◽  
Low Dislocation Density ◽  
Device Applications

Low dislocation density AlN on sapphire prepared by double sputtering and annealing

2020 ◽  
Vol 13 (9) ◽  
pp. 095501
Author(s):  
Ding Wang ◽  
Kenjiro Uesugi ◽  
Shiyu Xiao ◽  
Kenji Norimatsu ◽  
Hideto Miyake
Keyword(s):  
Dislocation Density ◽  
Low Dislocation Density

Growth Of Low-Dislocation-Density InP Single Crystals By The VCZ Method

1989 ◽  
Author(s):  
M. Tatsumi ◽  
T. Kawase ◽  
T. Araki ◽  
N. Yamabayashi ◽  
T. Iwasaki ◽  
...  
Keyword(s):  
Dislocation Density ◽  
Single Crystals ◽  
Low Dislocation Density

Trenched epitaxial lateral overgrowth of fast coalesced a-plane GaN with low dislocation density

2006 ◽  
Vol 89 (25) ◽  
pp. 251109 ◽  
Author(s):  
Te-Chung Wang ◽  
Tien-Chang Lu ◽  
Tsung-Shine Ko ◽  
Hao-Chung Kuo ◽  
Min Yu ◽  
...  
Keyword(s):  
Dislocation Density ◽  
Epitaxial Lateral Overgrowth ◽  
Lateral Overgrowth ◽  
Low Dislocation Density

Heteroepitaxy and Characterization of Low-Dislocation-Density GaN on Periodically Grooved Substrates

2000 ◽  
Vol 639 ◽  
Author(s):  
T. Detchprohm ◽  
M. Yano ◽  
R. Nakamura ◽  
S. Sano ◽  
S. Mochiduki ◽  
...  
Keyword(s):  
Dislocation Density ◽  
New Method ◽  
Growth Technique ◽  
New Approach ◽  
Density Area ◽  
Low Dislocation Density ◽  
Dislocation Densities ◽  
Movpe Growth

ABSTRACTWe have developed a new method to prepare low-dislocation-density GaN by using periodically grooved substrates in a conventional MOVPE growth technique. This new approach was demonstrated for GaN grown on periodically grooved α-Al2O3(0001), 6H-SiC(0001)Si and Si(111) substrates. Dislocation densities were 2×107 cm−2 in low-dislocation-density area.

scholarly journals Oxide Thin Film Heterostructures on Large Area, with Flexible Doping, Low Dislocation Density, and Abrupt Interfaces: Grown by Pulsed Laser Deposition

2010 ◽  
Vol 2010 ◽  
pp. 1-27 ◽  
Author(s):  
Michael Lorenz ◽  
Holger Hochmuth ◽  
Christoph Grüner ◽  
Helena Hilmer ◽  
Alexander Lajn ◽  
...  
Keyword(s):  
Thin Film ◽  
Dislocation Density ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Chemical Vapor ◽  
Laser Deposition ◽  
Oxide Thin Film ◽  
Organic Chemical ◽  
Large Area ◽  
Low Dislocation Density

Advanced Pulsed Laser Deposition (PLD) processes allow the growth of oxide thin film heterostructures on large area substrates up to 4-inch diameter, with flexible and controlled doping, low dislocation density, and abrupt interfaces. These PLD processes are discussed and their capabilities demonstrated using selected results of structural, electrical, and optical characterization of superconducting (YBa2Cu3O7−δ), semiconducting (ZnO-based), and ferroelectric (BaTiO3-based) and dielectric (wide-gap oxide) thin films and multilayers. Regarding the homogeneity on large area of structure and electrical properties, flexibility of doping, and state-of-the-art electronic and optical performance, the comparably simple PLD processes are now advantageous or at least fully competitive to Metal Organic Chemical Vapor Deposition or Molecular Beam Epitaxy. In particular, the high flexibility connected with high film quality makes PLD a more and more widespread growth technique in oxide research.

Topographic study of dislocation structure in hexagonal SiC single crystals with low dislocation density

2007 ◽  
Vol 304 (1) ◽  
pp. 57-63 ◽  
Author(s):  
Daisuke Nakamura ◽  
Satoshi Yamaguchi ◽  
Itaru Gunjishima ◽  
Yoshiharu Hirose ◽  
Tsunenobu Kimoto
Keyword(s):  
Dislocation Density ◽  
Single Crystals ◽  
Dislocation Structure ◽  
Low Dislocation Density

Using a continuous flow reactor for aqueous lateral epitaxial overgrowth of low-dislocation-density ZnO layers on honeycomb-patterned structures

CrystEngComm ◽  
2020 ◽  
Vol 22 (3) ◽  
pp. 487-496
Author(s):  
Hou-Guang Chen ◽  
Huei-Sen Wang ◽  
Shu-Han Yang ◽  
Xuan-Chen Lin
Keyword(s):  
Dislocation Density ◽  
Continuous Flow ◽  
Flow Reactor ◽  
Lateral Epitaxial Overgrowth ◽  
Continuous Flow Reactor ◽  
Low Dislocation Density ◽  
Long Duration ◽  
Patterned Structures ◽  
New Type

A new type of continuous flow reactor was used for long-duration lateral epitaxial overgrowth of low-dislocation-density ZnO layers.

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