Use of positive and negative chemically amplified resists in electron-beam direct-write lithography

1995 ◽  
Vol 13 (6) ◽  
pp. 2986 ◽  
Author(s):  
Alexander Tritchkov
Keyword(s):  
Electron Beam ◽  
Direct Write ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Application of a New Empirical Model to the Electron Beam Lithography Process with Chemically Amplified Resists

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6761-6766 ◽  
Author(s):  
Young-Mog Ham ◽  
Ki-Ho Baik ◽  
Won-Gyu Lee ◽  
Tack Dong Chung ◽  
Kukjin Chun
Keyword(s):  
Electron Beam ◽  
Empirical Model ◽  
Electron Beam Lithography ◽  
Lithography Process ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4301-4306 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists
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