Effect of oxygen implantation on the characteristic of Ge2Sb2Te5 phase change film

2004 ◽  
Author(s):  
Bo Liu ◽  
Zhitang Song ◽  
Ting Zhang ◽  
Songlin Feng ◽  
Bomy Chen
1992 ◽  
Vol 43 (12) ◽  
pp. 1146-1150
Author(s):  
Takanobu FUJIHANA ◽  
Yoshio OKABE ◽  
Katsuo TAKAHASHI ◽  
Masaya IWAKI

2011 ◽  
Vol 158 (5) ◽  
pp. H471 ◽  
Author(s):  
Moon Hyung Jang ◽  
Seung Jong Park ◽  
Dong Hyeok Lim ◽  
Sung Jin Park ◽  
Mann-Ho Cho ◽  
...  

1989 ◽  
Vol 157 ◽  
Author(s):  
F. Namavar ◽  
E. Cortesi ◽  
R.F. Pinizzotto ◽  
H. Yang

ABSTRACTWe have studied the effect of implantation temperature, dose step, and total dose on the buried Si02 layer formed with a multiple low dose oxygen implantation process. Furthermore, we have produced a continuous, high quality buried SiO2 layer about 1500 Å thick with a dose of only 7 × 1017 0+/cm2 at 160 keV. The thin SiO2 layer is important not only because of the possible economic advantages of reduced dose, but also because a thinner oxide layer is more radiation hard.


1998 ◽  
Vol 80 (1-4) ◽  
pp. 187-192 ◽  
Author(s):  
J. Żuk ◽  
T.J. Ochalski ◽  
M. Kulik ◽  
J. Liśkiewicz ◽  
A.P. Kobzev

2015 ◽  
Vol 36 (5) ◽  
pp. 056001 ◽  
Author(s):  
Dan Gao ◽  
Bo Liu ◽  
Ying Li ◽  
Zhitang Song ◽  
Wanchun Ren ◽  
...  

Atomic Energy ◽  
1993 ◽  
Vol 75 (5) ◽  
pp. 885-888
Author(s):  
S. S. Gerashchenko ◽  
M. I. Guseva ◽  
V. A. Koryukin ◽  
V. P. Obrezumov

2016 ◽  
Vol 52 (7) ◽  
pp. 1121-1127
Author(s):  
S. M. Reshetnikov ◽  
F. Z. Gil’mutdinov ◽  
E. M. Borisova ◽  
O. R. Bakieva

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