Acid diffusion characteristics of RELACS coating for 193-nm lithography

2004 ◽  
Author(s):  
Sungeun Hong ◽  
Takeshi Nishibe ◽  
Tetsuo Okayasu ◽  
Kiyohisa Takahashi ◽  
Yusuke Takano ◽  
...  
Keyword(s):  
Acid Diffusion ◽  
Diffusion Characteristics ◽  
193 Nm

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

2002 ◽  
Author(s):  
Takanori Kudo ◽  
Eric L. Alemy ◽  
Ralph R. Dammel ◽  
Woo-Kyu Kim ◽  
Sang-Ho Lee ◽  
...  
Keyword(s):  
Process Optimization ◽  
Acid Diffusion ◽  
193 Nm

Diffusion characteristics of plasma nitrided hard chromium on AISI 1010 steel

2015 ◽  
Vol 57 (5) ◽  
pp. 443-446 ◽  
Author(s):  
Murat Danışman ◽  
Mustafa Kocabaş ◽  
Nurhan Cansever
Keyword(s):  
Hard Chromium ◽  
Diffusion Characteristics

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

1994 ◽  
Vol 30 (14) ◽  
pp. 1133-1134 ◽  
Author(s):  
P. E. Dyer ◽  
K. C. Byron ◽  
R. J. Farley ◽  
R. Giedl
Keyword(s):  
Bragg Grating ◽  
Fibre Bragg Grating ◽  
Arf Laser ◽  
193 Nm

Inorganic Si-O-C Antireflection Coating at 193 nm for Cu Dual Damascene Process

2003 ◽  
Vol 150 (1) ◽  
pp. G58 ◽  
Author(s):  
Sang-Yun Lee ◽  
Yong-Bae Kim ◽  
Jeong Soo Byun
Keyword(s):  
Antireflection Coating ◽  
Dual Damascene ◽  
Damascene Process ◽  
193 Nm

Contextual DNA features significant for the DNA damage by the 193-nm ultraviolet laser beam

2012 ◽  
Vol 447 (1) ◽  
pp. 267-272 ◽  
Author(s):  
N. N. Vtyurina ◽  
S. L. Grohovsky ◽  
A. B. Vasiliev ◽  
I. I. Titov ◽  
P. M. Ponomarenko ◽  
...  
Keyword(s):  
Dna Damage ◽  
Laser Beam ◽  
Ultraviolet Laser ◽  
193 Nm

C–Br bond rupture in 193 nm photodissociation of vinyl bromide

1998 ◽  
Vol 231 (2-3) ◽  
pp. 345-353 ◽  
Author(s):  
Hideki Katayanagi ◽  
Nobuaki Yonekuira ◽  
Toshinori Suzuki
Keyword(s):  
Bond Rupture ◽  
Vinyl Bromide ◽  
193 Nm

Advantages of using the 223-nm compared with 193-nm radiation wavelength for ophthalmic applications

2002 ◽  
Author(s):  
Sergei N. Bagayev ◽  
Alexander M. Razhev ◽  
Andrey A. Zhupikov ◽  
Evgeny S. Kargapoltsev
Keyword(s):  
Radiation Wavelength ◽  
193 Nm

Photodissociation dynamics of AlO at 193 nm using time-sliced ion velocity imaging

2020 ◽  
Vol 33 (5) ◽  
pp. 649-652
Author(s):  
Fang-fang Li ◽  
Yu-jie Ma ◽  
Jia-xing Liu ◽  
Guan-jun Wang ◽  
Feng-yan Wang
Keyword(s):  
Velocity Imaging ◽  
Ion Velocity ◽  
193 Nm
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