Comparative study of chromeless and attenuated phase shift mask for 0.3-k 1 ArF lithography of DRAM

2003 ◽  
Author(s):  
Tae-Seung Eom ◽  
Chang M. Lim ◽  
Seo-Min Kim ◽  
Hee-Bom Kim ◽  
Se-Young Oh ◽  
...  
Keyword(s):  
Phase Shift ◽  
Comparative Study ◽  
Phase Shift Mask

Comparative study of binary intensity mask and attenuated phase shift mask using hyper-NA immersion lithography for sub-45nm era

2008 ◽  
Author(s):  
Tae-Seung Eom ◽  
Jun-Taek Park ◽  
Jung-Hyun Kang ◽  
Sarohan Park ◽  
Sunyoung Koo ◽  
...  
Keyword(s):  
Phase Shift ◽  
Comparative Study ◽  
Immersion Lithography ◽  
Phase Shift Mask

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

2004 ◽  
Vol 43 (2) ◽  
pp. 514-517
Author(s):  
Jai-Cheol Lee ◽  
Yong-Ho Oh ◽  
Sungwoo Lim ◽  
Chun Soo Go ◽  
Sung Su Roh
Keyword(s):  
Monte Carlo ◽  
Phase Shift ◽  
Automatic Design ◽  
Phase Shift Mask

Preliminary study of 65 nm node alternating phase-shift mask fabrication

2002 ◽  
Author(s):  
Kouji Hosono ◽  
Naoyuki Ishiwata ◽  
Satoru Asai ◽  
Hiroshi Maruyama ◽  
Yutaka Miyahara ◽  
...  
Keyword(s):  
Phase Shift ◽  
Preliminary Study ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Application of alternating phase shift mask to device fabrication

1995 ◽  
Author(s):  
Sunggi Kim ◽  
Sang-Gyun Woo ◽  
Woo-Sung Han ◽  
Young-Bum Koh ◽  
Moon-Yong Lee
Keyword(s):  
Phase Shift ◽  
Device Fabrication ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

2005 ◽  
Author(s):  
Mahesh Chandramouli ◽  
Bob Olshausen ◽  
Yulia Korobko ◽  
Sven Henrichs ◽  
Ping Qu ◽  
...  
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask

Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II

1993 ◽  
Author(s):  
Masa-aki Kurihara ◽  
Masumi Arai ◽  
Hiroshi Fujita ◽  
Hisashi Moro-oka ◽  
Yoichi Takahashi ◽  
...  
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask

Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithography

2009 ◽  
Vol 48 (6) ◽  
pp. 06FA06 ◽  
Author(s):  
Hyun-Duck Shin ◽  
Chang Young Jeoung ◽  
Tae Geun Kim ◽  
Sangsul Lee ◽  
In-Sung Park ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Phase Shift Mask

Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask

2010 ◽  
Author(s):  
Yoshifumi Sakamoto ◽  
Tomohito Hirose ◽  
Hitomi Tsukuda ◽  
Taichi Yamazaki ◽  
Yosuke Kojima ◽  
...  
Keyword(s):  
Phase Shift ◽  
Radiation Damage ◽  
193 Nm ◽  
Phase Shift Mask
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