Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens

2003 ◽  
Author(s):  
Kunio Watanabe ◽  
Eiji Kurose ◽  
Toshifumi Suganaga ◽  
Toshiro Itani
2021 ◽  
Vol 13 (4) ◽  
pp. 1-8
Author(s):  
Jia-Lin Du ◽  
Wei Yan ◽  
Li-Wei Liu ◽  
Fan-Xing Li ◽  
Fu-Ping Peng ◽  
...  

2004 ◽  
Author(s):  
Bolesh J. Skutnik ◽  
Brian Foley ◽  
Kelly B. Moran

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