Optical design of high-aperture aspherical projection lens

1991 ◽  
Author(s):  
Atsuo Osawa ◽  
Kyohei Fukuda ◽  
Kouji Hirata
Keyword(s):  
Optical Design ◽  
Projection Lens

Optical Design of Short Focal Digital Projection Lens

2011 ◽  
Vol 40 (12) ◽  
pp. 1855-1859
Author(s):  
陈琛 CHEN Chen ◽  
李维善 LI Wei-shan ◽  
张禹 ZHANG Yu ◽  
刘宵婵 LIU Xiao-chan
Keyword(s):  
Optical Design ◽  
Projection Lens ◽  
Digital Projection

Optical design for a LCD projection lens

2008 ◽  
Author(s):  
Qinhua Huang ◽  
Haobo Cheng ◽  
Yongtian Wang
Keyword(s):  
Optical Design ◽  
Projection Lens

Optical Design of Digital Movie Zoom Projection Lens

2012 ◽  
Vol 41 (10) ◽  
pp. 1186-1192
Author(s):  
李维善 LI Wei-shan ◽  
陈琛 CHEN Chen ◽  
张禹 ZHANG Yu ◽  
刘宵婵 LIU Xiao-chan
Keyword(s):  
Optical Design ◽  
Projection Lens

Optical design of single digital stereo dual-channel projection lens

2013 ◽  
Vol 6 (4) ◽  
pp. 563-569
Author(s):  
李维善 LI Wei-shan ◽  
陈琛 CHEN Chen ◽  
于国辉 YU Guo-hui ◽  
李臣友 LI Chen-you ◽  
刘宵婵 LIU Xiao-chan ◽  
...  
Keyword(s):  
Optical Design ◽  
Projection Lens ◽  
Dual Channel

Optical design of zoom projection lens

2017 ◽  
Vol 38 (2) ◽  
pp. 523-526
Author(s):  
Luo Chunhua ◽  
Yue Pinliang ◽  
Zhang Donghu ◽  
Liang Jiuwei
Keyword(s):  
Optical Design ◽  
Projection Lens

Analysis and Optical Design of 1:1 Projection Lithography System

2007 ◽  
Vol 364-366 ◽  
pp. 533-538
Author(s):  
Qing Hua Lin ◽  
Jin Yun Zhou ◽  
Wen Jing Li
Keyword(s):  
Repetition Rate ◽  
Pulse Repetition Rate ◽  
Optical Design ◽  
Pulse Repetition ◽  
Laser Source ◽  
Beam Shape ◽  
Projection Lens ◽  
Projection Lithography ◽  
Technical Specifications ◽  
Lithography System

For the 1:1 laser projection lithography system used to achieve large-area patterning with higher resolutions as well as higher throughput, the key parameters such as the laser beam geometry, the numerical aperture of projection lens, the laser source power and the pulse repetition rate are theoretically analyzed. It is expounded the process of uniform exposure in hexagonal beam shape, the advantages and limitations of 1:1 projection owing to numerical apertures deciding the resolution, as well as the cause of choosing larger laser power and pulse repetition rate. Meanwhile, the projection lens for a unit-magnification, refractive imaging system is tentatively simulationdesigned using ZEMAX optical design software. The optimized three-dimensional layout is plotted. For the designed results, the maximum optical path difference is smaller thanλ /4 within entire visual field. The resolution for feature sizes 10μm can be achieved within depth of focus 400μm by evaluating MTF. The maximum field curvature is within 10μm and the maximum distortion is small than 0.000007%. This fulfills the demands in technical specifications.

Use of the Magnetostatic Analogue In Electromagnetic Lens Engineering

1970 ◽  
Vol 28 ◽  
pp. 360-361
Author(s):  
John W. Coleman
Keyword(s):  
Boundary Conditions ◽  
High Performance ◽  
Force Fields ◽  
Optical Design ◽  
Direct Conversion ◽  
Design Engineering ◽  
Design Data ◽  
Scalar Potentials ◽  
Geometric Elements ◽  
At Will

In the design engineering of high performance electromagnetic lenses, the direct conversion of electron optical design data into drawings for reliable hardware is oftentimes difficult, especially in terms of how to mount parts to each other, how to tolerance dimensions, and how to specify finishes. An answer to this is in the use of magnetostatic analytics, corresponding to boundary conditions for the optical design. With such models, the magnetostatic force on a test pole along the axis may be examined, and in this way one may obtain priority listings for holding dimensions, relieving stresses, etc..The development of magnetostatic models most easily proceeds from the derivation of scalar potentials of separate geometric elements. These potentials can then be conbined at will because of the superposition characteristic of conservative force fields.

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