Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop

2002 ◽  
Author(s):  
Rainer Kaesmaier ◽  
Hans Loeschner ◽  
Patrick W. de Jager ◽  
Albrecht Ehrmann ◽  
Stefan Hirscher ◽  
...  
Keyword(s):  
Next Generation ◽  
Projection Lithography ◽  
Ion Projection Lithography ◽  
Next Generation Lithography

Reduce process bias of photomask manufacturing for next-generation lithography

2004 ◽  
Author(s):  
Booky Lee ◽  
Sharon Wang ◽  
Toroy Tian ◽  
Samuel Yang ◽  
Roy Chen
Keyword(s):  
Next Generation ◽  
Next Generation Lithography

E-beam writing: a next-generation lithography approach for thin-film head critical features

2002 ◽  
Vol 38 (1) ◽  
pp. 95-100 ◽  
Author(s):  
R.E. Fontana ◽  
J. Katine ◽  
M. Rooks ◽  
R. Viswanathan ◽  
J. Lille ◽  
...  
Keyword(s):  
Thin Film ◽  
Next Generation ◽  
Next Generation Lithography

Ion projection lithography for resistless patterning of thin magnetic films

2000 ◽  
Vol 53 (1-4) ◽  
pp. 605-608 ◽  
Author(s):  
W.H. Bruenger ◽  
M. Torkler ◽  
C. Dzionk ◽  
B.D. Terris ◽  
L. Folks ◽  
...  
Keyword(s):  
Magnetic Films ◽  
Projection Lithography ◽  
Thin Magnetic Films ◽  
Ion Projection Lithography

Wafer stage assembly for ion projection lithography

2001 ◽  
Vol 57-58 ◽  
pp. 181-185 ◽  
Author(s):  
Christoph Damm ◽  
Thomas Peschel ◽  
Stephan Risse ◽  
Ulf C. Kirschstein
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography

Resist technologies for ion projection lithography (IPL) stencil maskmaking

2000 ◽  
Author(s):  
Mathias Irmscher ◽  
Joerg Butschke ◽  
Klaus Elian ◽  
Bernd Hoefflinger ◽  
Karl Kragler ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography
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