Modeling the electrostatic self-assembly (ESA) fabrication process using cellular automata

2001 ◽  
Author(s):  
William B. Spillman, Jr. ◽  
Tingying Zeng ◽  
Richard O. Claus
Keyword(s):  
Cellular Automata ◽  
Self Assembly ◽  
Fabrication Process

Cellular-automata-based modeling of the electrostatic self-assembly (ESA) fabrication process

2001 ◽  
Author(s):  
William B. Spillman, Jr. ◽  
Tingying Zeng ◽  
Richard O. Claus
Keyword(s):  
Cellular Automata ◽  
Self Assembly ◽  
Fabrication Process

Self-Replicating Patterns in 2D Linear Cellular Automata

2014 ◽  
Vol 24 (01) ◽  
pp. 1430002 ◽  
Author(s):  
Selman Uguz ◽  
Uḡur Sahin ◽  
Hasan Akin ◽  
Irfan Siap
Keyword(s):  
Cellular Automata ◽  
Self Assembly ◽  
Statistical Physics ◽  
Spatial Scales ◽  
Real Life ◽  
Continuous System ◽  
Random Number Generation ◽  
Two Dimensional ◽  
Textile Design ◽  
Genetics Research

This paper studies the theoretical aspects of two-dimensional cellular automata (CAs), it classifies this family into subfamilies with respect to their visual behavior and presents an application to pseudo random number generation by hybridization of these subfamilies. Even though the basic construction of a cellular automaton is a discrete model, its macroscopic behavior at large evolution times and on large spatial scales can be a close approximation to a continuous system. Beyond some statistical properties, we consider geometrical and visual aspects of patterns generated by CA evolution. The present work focuses on the theory of two-dimensional CA with respect to uniform periodic, adiabatic and reflexive boundary CA (2D PB, AB and RB) conditions. In total, there are 512 linear rules over the binary field ℤ2for each boundary condition and the effects of these CA are studied on applications of image processing for self-replicating patterns. After establishing the representation matrices of 2D CA, these linear CA rules are classified into groups of nine and eight types according to their boundary conditions and the number of neighboring cells influencing the cells under consideration. All linear rules have been found to be rendering multiple self-replicating copies of a given image depending on these types. Multiple copies of any arbitrary image corresponding to CA find innumerable applications in real life situation, e.g. textile design, DNA genetics research, statistical physics, molecular self-assembly and artificial life, etc. We conclude by presenting a successful application for generating pseudo numbers to be used in cryptography by hybridization of these 2D CA subfamilies.

Cellular automata method for directed self-assembly modeling

2019 ◽  
Author(s):  
Evgeny Gornev ◽  
Mikhail Litavrin ◽  
Igor Matyushkin ◽  
Oleg Gushin
Keyword(s):  
Cellular Automata ◽  
Self Assembly ◽  
Assembly Modeling

МОДЕЛЬ ПРОЦЕССА САМОСБОРКИ В ЛИТОГРАФИЧЕСКОМ МЕТОДЕ DSA С ПРИМЕНЕНИЕМ КЛЕТОЧНЫХ АВТОМАТОВ

2020 ◽  
Vol 96 (3s) ◽  
pp. 653-654
Author(s):  
М.В. Литаврин ◽  
И.В. Матюшкин ◽  
Е.С. Горнев
Keyword(s):  
Cellular Automata ◽  
Self Assembly ◽  
Cellular Automata Model ◽  
Calculation Results

Разработана модель самосборки в методе DSA с помощью метода клеточных автоматов. Показаны первые результаты расчетов. The paper highlights a cellular automata model for self-assembly for DSA. The first calculation results have been shown.

Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

2015 ◽  
Vol 1750 ◽  
Author(s):  
Hironobu Sato ◽  
Yuriko Seino ◽  
Naoko Kihara ◽  
Yusuke Kasahara ◽  
Katsutoshi Kobayashi ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Critical Dimension ◽  
Fabrication Process ◽  
Fabrication Method ◽  
3 Dimensional ◽  
Immersion Lithography ◽  
Surface Work ◽  
Methacrylate Copolymer

ABSTRACTThis paper introduces a fabrication method to achieve sub-15 nm line-and-space (L/S) patterns by combining grapho- and chemo-epitaxy using poly(styrene-block-methyl methacrylate) copolymer (PS-b-PMMA). The fabrication method is simple, since it eliminates photoresist stripping and also does not require any special materials to form pinning patterns. In this process, the ridges formed on spin-on-glass (SOG) surface work as physical guides and the photoresists on them are utilized as a pinning layer. Fine PS-b-PMMA L/S patterns were obtained in sufficient critical dimension (CD) range of the guide patterns that corresponded to the 15% dose margin using ArF immersion lithography. 3-dimensional grid defects were found to be the origin of the short defects. The half-pitch (hp) 15 nm L/S patterns were transferred successfully to SOG/spin-on-carbon (SOC) stacked substrate.We also describe fabrication of sub-10 nm L/S patterns using a high-chi block copolymer (BCP).

Cellular automata as models of inorganic structures self-assembly (Illustrated by uranyl selenate)

2013 ◽  
Vol 39 (1) ◽  
pp. 1-10 ◽  
Author(s):  
V. Ya. Shevchenko ◽  
S. V. Krivovichev ◽  
I. G. Tananaev ◽  
B. F. Myasoedov
Keyword(s):  
Cellular Automata ◽  
Self Assembly
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