Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

2015 ◽  
Vol 1750 ◽  
Author(s):  
Hironobu Sato ◽  
Yuriko Seino ◽  
Naoko Kihara ◽  
Yusuke Kasahara ◽  
Katsutoshi Kobayashi ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Critical Dimension ◽  
Fabrication Process ◽  
Fabrication Method ◽  
3 Dimensional ◽  
Immersion Lithography ◽  
Surface Work ◽  
Methacrylate Copolymer

ABSTRACTThis paper introduces a fabrication method to achieve sub-15 nm line-and-space (L/S) patterns by combining grapho- and chemo-epitaxy using poly(styrene-block-methyl methacrylate) copolymer (PS-b-PMMA). The fabrication method is simple, since it eliminates photoresist stripping and also does not require any special materials to form pinning patterns. In this process, the ridges formed on spin-on-glass (SOG) surface work as physical guides and the photoresists on them are utilized as a pinning layer. Fine PS-b-PMMA L/S patterns were obtained in sufficient critical dimension (CD) range of the guide patterns that corresponded to the 15% dose margin using ArF immersion lithography. 3-dimensional grid defects were found to be the origin of the short defects. The half-pitch (hp) 15 nm L/S patterns were transferred successfully to SOG/spin-on-carbon (SOC) stacked substrate.We also describe fabrication of sub-10 nm L/S patterns using a high-chi block copolymer (BCP).

scholarly journals Synthesis and characterization of a new hydrogen bonded side chain liquid crystal block copolymer and investigation of electrical properties

2017 ◽  
Vol 89 (1) ◽  
pp. 19-28 ◽  
Author(s):  
Burak Korkmaz ◽  
Esma Ahlatcıoğlu Özerol ◽  
Ayşegül Çelik Bozdoğan ◽  
Mustafa Okutan ◽  
Bahire Filiz Şenkal ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Liquid Crystalline ◽  
Hydroxyl Group ◽  
Side Chain ◽  
Complex Dielectric Constant ◽  
Hydrogen Bond Formation ◽  
Crystal Block ◽  
Poly Ethylene ◽  
Methacrylate Copolymer

AbstractA new PEG-containing liquid crystalline side chain block copolymer HBC-PEG550 was prepared from poly(ethylene glycol)-b-poly(2-(diethylamino) ethyl methacrylate copolymer (BC-PEG550) and 8-(4-cyanobiphenyl-4′-oxy) octan-1-ol (LC8) by molecular self-assembly processes via hydrogen bond formation between amine group of HBC-PEG550 and hydroxyl group of the LC8. The formation of H bond was confirmed by using FTIR spectroscopy. The liquid crystalline behavior of the HBC-PEG550 was investigated by differential scanning calorimeter (DSC) and polarized optical microscopy. Dielectric properties of HBC-PEG550 and HBC-PEG550 has been studied by impedance spectroscopy. Real and imaginary parts of complex dielectric constant, impedance, and energy loss tangent factor for HBC-PEG550 and HBC-PEG550 have been characterized in the frequency range of 100 Hz–15 MHz.

scholarly journals Self-Assembly of Molecular Brushes with Polyimide Backbone and Amphiphilic Block Copolymer Side Chains in Selective Solvents

Polymers ◽  
2020 ◽  
Vol 12 (12) ◽  
pp. 2922
Author(s):  
Maria Simonova ◽  
Ivan Ivanov ◽  
Tamara Meleshko ◽  
Alexey Kopyshev ◽  
Svetlana Santer ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Amphiphilic Block Copolymer ◽  
Side Chains ◽  
Poly Methyl Methacrylate ◽  
Molecular Brushes ◽  
Selective Solvents ◽  
Significant Difference ◽  
Thermodynamic Quality

Three-component molecular brushes with a polyimide backbone and amphiphilic block copolymer side chains with different contents of the “inner” hydrophilic (poly(methacrylic acid)) and “outer” hydrophobic (poly(methyl methacrylate)) blocks were synthesized and characterized by molecular hydrodynamics and optics methods in solutions of chloroform, dimethylformamide, tetrahydrofuran and ethanol. The peculiarity of the studied polymers is the amphiphilic structure of the grafted chains. The molar masses of the molecular brushes were determined by static and dynamic light scattering in chloroform in which polymers form molecularly disperse solutions. Spontaneous self-assembly of macromolecules was detected in dimethylformamide, tetrahydrofuran and ethanol. The aggregates size depended on the thermodynamic quality of the solvent as well as on the macromolecular architectural parameters. In dimethylformamide and tetrahydrofuran, the distribution of hydrodynamic radii of aggregates was bimodal, while in ethanol, it was unimodal. Moreover, in ethanol, an increase in the poly(methyl methacrylate) content caused a decrease in the hydrodynamic radius of aggregates. A significant difference in the nature of the blocks included in the brushes determines the selectivity of the used solvents, since their thermodynamic quality with respect to the blocks is different. The macromolecules of the studied graft copolymers tend to self-organization in selective solvents with formation of a core–shell structure with an insoluble solvophobic core surrounded by the solvophilic shell of side chains.

Investigation of cross-linking poly(methyl methacrylate) as a guiding material in block copolymer directed self-assembly

2014 ◽  
Author(s):  
Robert Seidel ◽  
Paulina Rincon Delgadillo ◽  
Abelardo Ramirez-Hernandez ◽  
Hengpeng Wu ◽  
Youngjun Her ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Cross Linking ◽  
Poly Methyl Methacrylate

A facile method to fabricate carbon nanostructures via the self-assembly of polyacrylonitrile/poly(methyl methacrylate-b-polyacrylonitrile) AB/B′ type block copolymer/homopolymer blends

RSC Advances ◽  
2016 ◽  
Vol 6 (61) ◽  
pp. 55792-55799 ◽  
Author(s):  
A. Palanisamy ◽  
N. V. Salim ◽  
B. L. Fox ◽  
P. Jyotishkumar ◽  
T. Pradeep ◽  
...  
Keyword(s):  
High Temperature ◽  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Carbon Nanostructures ◽  
The Self ◽  
Temperature Behavior ◽  
High Temperature Behavior ◽  
Homopolymer Blends ◽  
First Time

The self-assembly and high temperature behavior of AB/B′ type block copolymer/homopolymer blends containing polyacrylonitrile (PAN) polymers were studied for the first time.

scholarly journals Development of PVDF Ultrafiltration Membrane with Zwitterionic Block Copolymer Micelles as a Selective Layer

Membranes ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 93 ◽  
Author(s):  
Hajeeth Thankappan ◽  
Gauthier Bousquet ◽  
Mona Semsarilar ◽  
Antoine Venault ◽  
Yung Chang ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Membrane Surface ◽  
Ultrafiltration Membrane ◽  
Mechanical Resistance ◽  
Pvdf Membrane ◽  
Selective Layer ◽  
Poly Methyl Methacrylate ◽  
Copolymer Micelles ◽  
Methacrylate Copolymer

In recent years, block copolymer micellar assemblies with the formation of structured nanoparticles have been considered as an emerging technology in membrane science. In this work, the poly(methyl methacrylate)-block-poly(sulfobetaine methacrylate) copolymer was directly synthesized using Reversible Addition-Fragmentation chain Transfer (RAFT) polymerization and self-assembled in a selective medium (2,2,2-trifluroethanol/water). Then, poly(methyl methacrylate)-block-poly(sulfobetaine methacrylate) copolymers were casted onto a commercial PVDF membrane to form a thin porous selective layer. The prepared nanoparticles and the resulting membranes were fully characterized using microscopy methods (SEM and AFM), whereas the membrane performance was evaluated in terms of permeability and the molecular weight cut off. The results from this study demonstrate the preparation of an ultrafiltration membrane made from the assembly of poly(methyl methacrylate)-block-poly(sulfobetaine methacrylate) copolymer micelles on the top of a PVDF membrane in the form of thin film. The copolymer chain orientation leads to a membrane surface enriched in hydrophilic PSBMA, which confers a suitable behavior for aqueous solution filtration on the membrane, while preserving the high chemical and mechanical resistance of the PVDF.

Tailoring Microdomain Orientation in Block Copolymer Thin Films for Lithographic Application

2006 ◽  
Vol 961 ◽  
Author(s):  
Hiroshi Yoshida ◽  
Hirofumi Kitano ◽  
Satoshi Akasaka ◽  
Tomohiro Inoue ◽  
Mikihito Taknaka ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Simple Technique ◽  
Film Surface ◽  
Magnetic Media ◽  
Regular Array ◽  
Block Copolymer Lithography

ABSTRACTBlock copolymer lithography is a promising method for fabricating periodical nano patterns less than 20nm by self-assembly and can be applicable for fabricating patterned magnetic media with recording density over 1Tbit/inch2. We found a simple technique to control the orientation of cylindrical microdomains in thin films. Only by mixing polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with the constituent homopolymer (PS or PMMA), we could align the cylindrical microdomains perpendicular to the film surface. The added homopolymer induces conformational entropic relaxation of the block chains in microdomain space and stabilizes perpendicular orientation of hexagonally packed cylindrical microdomains. Thus formed perpendicular cylinders can be readily aligned in a regular array with a grating substrate.

Porous membranes from acid decorated block copolymer nano-objects via RAFT alcoholic dispersion polymerization

2016 ◽  
Vol 7 (10) ◽  
pp. 1899-1906 ◽  
Author(s):  
Lakshmeesha Upadhyaya ◽  
Mona Semsarilar ◽  
Rodrigo Fernández-Pacheco ◽  
Gema Martinez ◽  
Reyes Mallada ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Diblock Copolymer ◽  
Self Assembly ◽  
Dispersion Polymerization ◽  
Porous Membranes

Acid decorated diblock copolymer nano-objects were prepared by polymerization-induced self-assembly via RAFT dispersion polymerization of methyl methacrylate. Spheres were used to prepare thin film membranes.

Random Poly(methyl methacrylate-co -styrene) Brushes by ATRP to Create Neutral Surfaces for Block Copolymer Self-Assembly

2011 ◽  
Vol 213 (1) ◽  
pp. 108-115 ◽  
Author(s):  
Hui Liu ◽  
Colm T. O'Mahony ◽  
Fabrice Audouin ◽  
Claudia Ventura ◽  
Michael Morris ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Methyl Methacrylate ◽  
Self Assembly ◽  
Poly Methyl Methacrylate

The Self-Assembly of an Amphiphilic Block Copolymer: A Dissipative Particle Dynamics Study

2005 ◽  
Vol 42 (3) ◽  
pp. 180-183 ◽  
Author(s):  
S. G. Schulz ◽  
U. Frieske ◽  
H. Kuhn ◽  
G. Schmid ◽  
F. Müller ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Dissipative Particle Dynamics ◽  
Particle Dynamics ◽  
The Self ◽  
Amphiphilic Block Copolymer
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