Two types of excitons in poly(p-phenylene-vinylene) thick film at high-density excited state

2001 ◽  
Author(s):  
Shunsuke Kobayashi ◽  
Fumio Sasaki ◽  
Kazuhiro Murata ◽  
Takanobu Noguchi ◽  
Toshihiro Ohonishi
2007 ◽  
Vol 1030 ◽  
Author(s):  
Jeroen van den Brand ◽  
Erik Veninga ◽  
Roel Kusters ◽  
Tomas Podprocky ◽  
Andreas Dietzel

AbstractA novel, cost effective technology to manufacture high density embedded electronic circuitry is demonstrated. The process consists of laser photoablation of the circuitry into a substrate through a mask and subsequent filling using a polymer thick film paste. Because the volume of the substrate is used it is possible to make thick and thereby highly conductive lines using low cost materials and processes. The process is demonstrated for a fan out circuitry in 100 µm thick polyethylene naphthalate (PEN). The fan out circuitry has linewidths of 50 µm and line spacings of 100 µm. The usability of the circuitry is demonstrated by the successful flipchip bonding of a thinned Si daisy chain dummy chip with 176 IO's.


2009 ◽  
Vol 6 (1) ◽  
pp. 6-12 ◽  
Author(s):  
Arne Albertsen ◽  
Koji Koiwai ◽  
Kyoji Kobayashi ◽  
Tomonori Oguchi ◽  
Katsumi Aruga

This paper highlights the possible combination of technologies such as thick film screen printing, ink jet, and post-firing thin film processes in conjunction with laser-drilled fine vias to produce high-density, miniaturized LTCC substrates. To obtain the silver pattern on the inner layers, both conventional thick film printing and ink jet printing (using nano silver particle dispersed ink) were applied on the ceramic green sheets. The ink jet process made it possible to metallize fine lines with line/space = 30/30 μm. For interlayer connections, fine vias of 30 μm in diameter formed by UV laser were used. Then these sheets were stacked on top of each other and fired to obtain a base substrate. On this base substrate, fine copper patterns for flip chip mounting were formed by a thin film process. The surface finish consisted of a nickel passivation and a gold layer deposited by electroless plating. The combination of the three patterning processes for conducting traces and UV laser drilling of fine vias make it appear possible to realize fine pitch LTCC, for example, for flip chip device mounting.


2020 ◽  
Vol 101 ◽  
pp. 109714
Author(s):  
Wei Dang ◽  
Ningbo Xie ◽  
Changfu Feng ◽  
Ying Wang ◽  
Kai Wang ◽  
...  

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