Continuum model of shot noise and line edge roughness

Local critical dimension variation from shot-noise related line edge roughness

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.2127941 ◽

2005 ◽

Vol 23 (6) ◽

pp. 3033 ◽

Cited By ~ 36

Author(s):

P. Kruit ◽

S. Steenbrink

Keyword(s):

Shot Noise ◽

Critical Dimension ◽

Line Edge Roughness ◽

Edge Roughness ◽

Related Line

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Relationship between Sensitization Distance and Photon Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.30.197 ◽

2017 ◽

Vol 30 (2) ◽

pp. 197-203 ◽

Cited By ~ 3

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Shot Noise ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Line Edge Roughness ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Edge Roughness ◽

Chemically Amplified Resists

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Investigation of shot-noise-induced line-edge roughness by continuous-model-based simulation

10.1117/12.535516 ◽

2004 ◽

Cited By ~ 3

Author(s):

Lei Yuan ◽

Andrew R. Neureuther

Keyword(s):

Shot Noise ◽

Continuous Model ◽

Line Edge Roughness ◽

Model Based ◽

Edge Roughness

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Do not always blame the photons: Relationships between deprotection blur, line-edge roughness, and shot noise in extreme ultraviolet photoresists

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3100270 ◽

2009 ◽

Vol 27 (2) ◽

pp. 665 ◽

Cited By ~ 14

Author(s):

Christopher N. Anderson ◽

Patrick P. Naulleau

Keyword(s):

Shot Noise ◽

Extreme Ultraviolet ◽

Line Edge Roughness ◽

Edge Roughness

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Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4991054 ◽

2017 ◽

Vol 35 (6) ◽

pp. 061602 ◽

Cited By ~ 1

Author(s):

Suchit Bhattarai ◽

Andrew R. Neureuther ◽

Patrick P. Naulleau

Keyword(s):

Electron Beam ◽

Comparative Analysis ◽

Shot Noise ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Line Edge Roughness ◽

Ultraviolet Lithography ◽

Edge Roughness

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Relationship between Resolution Blur and Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme-Ultraviolet Lithography

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.31.183 ◽

2018 ◽

Vol 31 (2) ◽

pp. 183-188 ◽

Cited By ~ 3

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Shot Noise ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Line Edge Roughness ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Edge Roughness ◽

Chemically Amplified Resists

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Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.2501 ◽

2008 ◽

Vol 47 (4) ◽

pp. 2501-2505 ◽

Cited By ~ 2

Author(s):

Atsuko Yamaguchi ◽

Daisuke Ryuzaki ◽

Ken-ichi Takeda ◽

Jiro Yamamoto ◽

Hiroki Kawada ◽

...

Keyword(s):

Line Edge Roughness ◽

Edge Roughness

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Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1490392 ◽

2002 ◽

Vol 20 (4) ◽

pp. 1342 ◽

Cited By ~ 44

Author(s):

Masaki Yoshizawa ◽

Shigeru Moriya

Keyword(s):

Evaluation Method ◽

Line Edge Roughness ◽

Diffusion Effect ◽

Acid Diffusion ◽

Edge Roughness ◽

On Line ◽

Roughness Evaluation

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Interactions Between Line Edge Roughness and Random Dopant Fluctuation in Nonplanar Field-Effect Transistor Variability

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2276072 ◽

2013 ◽

Vol 60 (10) ◽

pp. 3277-3284 ◽

Cited By ~ 26

Author(s):

Greg Leung ◽

Chi On Chui

Keyword(s):

Field Effect ◽

Field Effect Transistor ◽

Line Edge Roughness ◽

Random Dopant Fluctuation ◽

Edge Roughness ◽

Effect Transistor ◽

Random Dopant

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Application of cellular neural networks in the measurement of line-width and line edge roughness

10.1117/12.676727 ◽

2006 ◽

Author(s):

Hong-bo Li ◽

Xue-zheng Zhao ◽

Wei Chu ◽

Ning Li

Keyword(s):

Neural Networks ◽

Line Width ◽

Cellular Neural Networks ◽

Line Edge Roughness ◽

Edge Roughness

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