Novel spin-coating technology for 248-nm/193-nm DUV lithography and low-k spin on dielectrics of 200-mm/300-mm wafers

2000 ◽  
Author(s):  
Emir Gurer ◽  
Tom X. Zhong ◽  
John W. Lewellen ◽  
Ed C. Lee
Keyword(s):  
Spin Coating ◽  
Coating Technology ◽  
193 Nm ◽  
Low K

From square to circular polymeric microchannels by spin coating technology: a low cost platform for endothelial cell culture

2016 ◽  
Vol 8 (2) ◽  
pp. 025005 ◽  
Author(s):  
Raffaele Vecchione ◽  
Gabriele Pitingolo ◽  
Daniela Guarnieri ◽  
Andrea P Falanga ◽  
Paolo A Netti
Keyword(s):  
Cell Culture ◽  
Endothelial Cell ◽  
Spin Coating ◽  
Low Cost ◽  
Coating Technology ◽  
Endothelial Cell Culture

Spin-Coating Technology of the Cover Layer for Digital Video Recording-Blue Disc

2002 ◽  
Vol 41 (Part 1, No. 6A) ◽  
pp. 3922-3923 ◽  
Author(s):  
Tsuyoshi Komaki ◽  
Hideki Hirata ◽  
Mamoru Usami ◽  
Tomoki Ushida ◽  
Naoki Hayashida ◽  
...  
Keyword(s):  
Spin Coating ◽  
Digital Video ◽  
Video Recording ◽  
Coating Technology ◽  
Cover Layer

Blu-Ray Disc Cover Layer Production using Spin Coating Technology

2006 ◽  
Author(s):  
B. Heinz ◽  
T. Eisenhammer ◽  
M. Dubs ◽  
C. Yavaser ◽  
T. Pfaff
Keyword(s):  
Spin Coating ◽  
Coating Technology ◽  
Cover Layer

OPTICAL PROPERTIES OF AMORPHOUS ARSENIC SELENIDE FILMS PREPARED BY SPIN-COATING TECHNOLOGY

2018 ◽  
Vol 63 ◽  
pp. 147-152
Author(s):  
S. A. Kozyukhin ◽  
◽  
Thi Hang Nguyen ◽  
A. A. Korlyukov ◽  
A. A. Polohin ◽  
...  
Keyword(s):  
Optical Properties ◽  
Spin Coating ◽  
Coating Technology ◽  
Arsenic Selenide

A New Ultra-Low K ILD Material Based On Organic-Inorganic Hybrid Resins

2002 ◽  
Vol 716 ◽  
Author(s):  
Ben Zhong ◽  
Herman Meynen ◽  
Francesca Iocopi ◽  
Ken Weidner ◽  
Stephane Mailhouitre ◽  
...  
Keyword(s):  
Material Properties ◽  
Spin Coating ◽  
Average Pore Size ◽  
Chemical Bonds ◽  
Thermal Cure ◽  
Average Pore ◽  
Positron Annihilation Lifetime ◽  
New Material ◽  
Highly Hydrophobic ◽  
Low K

AbstractA ULK material based on a siloxane resin has been developed that can be processed using spin-coating and thermal cure to yield porous low-k films. The chemical bonds between the resin and porogen groups prevent the phase separation of the porogen from the resin during curing and lead to extremely small pores. The highly hydrophobic thin films made from this material displayed dielectric constant of 1.8, breakdown voltage of 4 MV/cm, a cohesive strength > 60 MPa, excellent crack resistance, and an average pore size of 2.2 nm by Positron Annihilation Lifetime Spectroscopy (PALS) and 2.5-3.0 nm by Ellipsometric Porosimetry (EP). In this paper, our strategy for designing low-k materials, the material properties and initial integration results for this new material will be discussed.

Study on polarization characteristics of BiFeO3thin films prepared by sol-gel spin-coating technology

2015 ◽  
Vol 71 (1) ◽  
pp. 10301 ◽  
Author(s):  
Ze Jia ◽  
Xiao Wu ◽  
Mingming Zhang ◽  
Jianlong Xu ◽  
Naiwen Zhang ◽  
...  
Keyword(s):  
Spin Coating ◽  
Sol Gel ◽  
Coating Technology ◽  
Polarization Characteristics

Blu-Ray Disc cover layer production using spin coating technology

2007 ◽  
Author(s):  
Bernd Heinz ◽  
Thomas Eisenhammer ◽  
Martin Dubs ◽  
Cem Yavaser ◽  
Thomas Pfaff
Keyword(s):  
Spin Coating ◽  
Coating Technology ◽  
Cover Layer

Haze detection and haze-induced process latitude variation for low-k 1 193 nm lithography

2006 ◽  
Author(s):  
Sung-Jin Kim ◽  
Jin-Baek Park ◽  
Sung-Hyuck Kim ◽  
Hye-Young Kang ◽  
Young-Min Kang ◽  
...  
Keyword(s):  
Latitude Variation ◽  
193 Nm ◽  
Low K
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