Improvements of the membrane bulging method for stress determination of silicon open stencil masks for ion projection lithography

2000 ◽  
Author(s):  
Artur Degen ◽  
Jens Voigt ◽  
Eva Sossna ◽  
Feng Shi ◽  
Ivo W. Rangelow ◽  
...  
Keyword(s):  
Stress Determination ◽  
Projection Lithography ◽  
Ion Projection Lithography

scholarly journals Methods for Structural Stress Determination according to EN 13445-3 Annex NA – Comparison with other Codes for Unfired Pressure Vessels

2018 ◽  
Vol 165 ◽  
pp. 10003
Author(s):  
Ralf Trieglaff ◽  
Jürgen Rudolph ◽  
Martin Beckert ◽  
Daniel Friers
Keyword(s):  
Pressure Vessel ◽  
Pressure Vessels ◽  
Structural Stress ◽  
Stress Determination ◽  
User Friendliness ◽  
Fatigue Assessment ◽  
Shell Elements ◽  
European Working ◽  
The Status

The European Pressure Vessel Standard EN 13445 provides in its part 3 (Design) a simplified method (Clause 17) and a detailed method for fatigue assessment (Clause 18). Clause 18 “Detailed Assessment of Fatigue Life” is under revision within the framework of the European working group CEN/TC 54/WG 53 – Design methods with the aim of reaching a significant increase in user-friendliness and a clear guideline for the application. This paper is focused on the new informative annex NA ”Instructions for structural stress oriented finite elements analyses using brick and shell elements”. As an essential amendment for the practical user, the determination of structural stress ranges for fatigue assessment of welds is further specified in this new annex. Different application methods for the determination of structural stresses are explained in connection with the requirements for finite element models and analyses. This paper will give a short overview of the proposed approaches of structural stress determination in annex NA of the revised EN 13445-3. It will present the status of the approaches based on the results of fatigue analyses according to EN 13445-3 Clause 18 for different application examples. For verification purposes, the results of the approaches proposed in EN 13445-3 are compared with the results of other pressure vessel design codes for nuclear and non-nuclear application.

Ion projection lithography for resistless patterning of thin magnetic films

2000 ◽  
Vol 53 (1-4) ◽  
pp. 605-608 ◽  
Author(s):  
W.H. Bruenger ◽  
M. Torkler ◽  
C. Dzionk ◽  
B.D. Terris ◽  
L. Folks ◽  
...  
Keyword(s):  
Magnetic Films ◽  
Projection Lithography ◽  
Thin Magnetic Films ◽  
Ion Projection Lithography

Wafer stage assembly for ion projection lithography

2001 ◽  
Vol 57-58 ◽  
pp. 181-185 ◽  
Author(s):  
Christoph Damm ◽  
Thomas Peschel ◽  
Stephan Risse ◽  
Ulf C. Kirschstein
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography

Resist technologies for ion projection lithography (IPL) stencil maskmaking

2000 ◽  
Author(s):  
Mathias Irmscher ◽  
Joerg Butschke ◽  
Klaus Elian ◽  
Bernd Hoefflinger ◽  
Karl Kragler ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Ion Projection Lithography

Reference plate manufacturing process for the ion projection lithography pattern lock system

2001 ◽  
Vol 57-58 ◽  
pp. 213-218
Author(s):  
F. Letzkus ◽  
J. Butschke ◽  
M. Irmscher ◽  
C. Reuter ◽  
R. Springer ◽  
...  
Keyword(s):  
Manufacturing Process ◽  
Projection Lithography ◽  
Ion Projection Lithography ◽  
Reference Plate

Sources of error in yield stress determination of doped crystals

1985 ◽  
Vol 20 (5) ◽  
pp. K50-K51
Author(s):  
M. Hartmanová ◽  
G. A. Andreev
Keyword(s):  
Yield Stress ◽  
Stress Determination ◽  
Sources Of Error
Sign in / Sign up

Export Citation Format

Share Document