Determination of residual stress and elastic constants of silicon open stencil masks for ion projection lithography
Keyword(s):
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1996 ◽
Vol 25
(2-4)
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pp. 229-236
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2001 ◽
Vol 49
(12)
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pp. 2193-2203
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2013 ◽
Vol 768-769
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pp. 201-208
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1995 ◽
Vol 52
(12)
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pp. R8707-R8710
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