In-situ beam position monitoring system for electron-beam lithography

1999 ◽  
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Munehiro Ogasawara ◽  
Jun Takamatsu ◽  
Naoharu Shimomura
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C. H. Kuo ◽  
P. C. Chiu ◽  
Jenny Chen ◽  
K.H. Hu ◽  
K. T. Hsu

Nano Letters ◽  
2018 ◽  
Vol 18 (8) ◽  
pp. 5036-5041 ◽  
Author(s):  
Yu Hong ◽  
Ding Zhao ◽  
Dongli Liu ◽  
Binze Ma ◽  
Guangnan Yao ◽  
...  

2015 ◽  
Vol 86 (7) ◽  
pp. 073903 ◽  
Author(s):  
Arsenty Kaganskiy ◽  
Manuel Gschrey ◽  
Alexander Schlehahn ◽  
Ronny Schmidt ◽  
Jan-Hindrik Schulze ◽  
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2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GL07 ◽  
Author(s):  
Hiroki Miyazako ◽  
Kazuhiko Ishihara ◽  
Kunihiko Mabuchi ◽  
Takayuki Hoshino

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K. Shinoe ◽  
T. Koseki ◽  
Y. Kamiya ◽  
N. Nakamura ◽  
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1996 ◽  
Vol 40 (1-8) ◽  
pp. 627-631 ◽  
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N Tanaka ◽  
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T Ishikawa

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