In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam–direct-write lithography
2011 ◽
Vol 29
(4)
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pp. 041607
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Keyword(s):
Keyword(s):
Keyword(s):
1996 ◽
Vol 35
(Part 1, No. 12B)
◽
pp. 6652-6658
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