Nanometer-scale pattern formation of GaAs by in situ electron-beam lithography using surface oxide layer as a resist film

Author(s):  
Tomonori Ishikawa
2018 ◽  
Vol 2018 (0) ◽  
pp. GS0704 ◽  
Author(s):  
Toshiyuki KONDO ◽  
Daiki MIKI ◽  
Hiroyuki HIRAKATA ◽  
Kohji MINOSHIMA

1992 ◽  
Vol 3 (2) ◽  
pp. 54-59 ◽  
Author(s):  
H Kawanishi ◽  
Y Sugimoto ◽  
K Akita ◽  
N Tanaka ◽  
T Ishikawa

1996 ◽  
Vol 35 (Part 2, No. 5B) ◽  
pp. L619-L622 ◽  
Author(s):  
Tomonori Ishikawa ◽  
Nobuyuki Tanaka ◽  
Máximo López ◽  
Isamu Matsuyama

2012 ◽  
Vol 87 (5-6) ◽  
pp. 580-583 ◽  
Author(s):  
Yasuhisa Oya ◽  
Makoto Kobayashi ◽  
Junya Osuo ◽  
Masato Suzuki ◽  
Akiko Hamada ◽  
...  

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