Fabrication of bandgap-tuned lasers in GaAs/AlGaAs structure using sol-gel SiO2-induced quantum well intermixing

1999 ◽  
Author(s):  
Lye Huat Lee ◽  
Oki Gunawan ◽  
Boon Siew Ooi ◽  
Yan Zhou ◽  
Yuen Chuen Chan ◽  
...  
1998 ◽  
Author(s):  
Lye Huat Lee ◽  
Boon Siew Ooi ◽  
Yee Loy Lam ◽  
Yuen Chuen Chan ◽  
Chan Hin Kam

2005 ◽  
Vol 891 ◽  
Author(s):  
Hery Susanto Djie ◽  
Boon-Siew Ooi ◽  
Charles Kin-Fai Ho ◽  
Ting Mei ◽  
Kantisara Pita ◽  
...  

ABSTRACTWe report the intermixing enhancement using the Ge-doped sol-gel derived silica encapsulant layer in InGaAs/InGaAsP quantum-well laser structure. A bandgap shift of ∼64 nm has been observed from 16% Ge-doped silica capped sample at an annealing temperature of 630°C while the intermixing at the similar temperature can be effectively suppressed with the e-beam evaporated SiO2 encapsulant layer. Using our theoretical model, nearly identical activation energy of 1.7±0.5 eV was obtained from the intermixed sample with Ge-doped silica. Similar intermixing enhancement holds for high Ge-content cap in the intermixed GaAs/AlGaAs quantum-wells related to Ga vacancy injection. We postulate that the dissimilarity in interdiffusion behavior between 0% and 16% Ge-doped silica capped sample is only attributed to the difference in the number of beneficial vacancies that involve in the intermixing process.


2003 ◽  
Vol 94 (3) ◽  
pp. 1550-1556 ◽  
Author(s):  
H. D. Sun ◽  
R. Macaluso ◽  
M. D. Dawson ◽  
F. Robert ◽  
A. C. Bryce ◽  
...  

2004 ◽  
Vol 48 (10-11) ◽  
pp. 1783-1790 ◽  
Author(s):  
Gregory B. Tait ◽  
David B. Ameen

1999 ◽  
Vol 607 ◽  
Author(s):  
A. Saher Helmy ◽  
A.C. Bryce ◽  
C.N. Ironside ◽  
J.S. Aitchison ◽  
J.H. Marsh ◽  
...  

AbstractIn this paper we shall discuss techniques for accurate, non-destructive, optical characterisation of structures fabricated using quantum well intermixing (QWI). Spatially resolved photoluminescence and Raman spectroscopy were used to characterise the lateral bandgap profiles produced by impurity free vacancy disordering (IFVD) technology. Different features were used to examine the spatial resolution of the intermixing process. Features include 1:1 gratings as well as isolated stripes. From the measurements, the spatial selectivity of IFVD could be identified, and was found to be ∼4.5 μm, in contrast with the spatial resolution of the process of sputtering induced intermixing, which was found to be ∼2.5 μm. In addition, PL measurements on 1:1 gratings fabricated using IFVD show almost complete suppression of intermixing dielectric cap gratings with periods less than 10 microns. Finally, some insight into the limitations and merits of PL and Raman for the precision characterisation of QWI will be presented.


Author(s):  
A. De Groote ◽  
J. D. Peters ◽  
M. L. Davenport ◽  
M. J. R. Heck ◽  
R. Baets ◽  
...  

1998 ◽  
Vol 37 (Part 1, No. 9A) ◽  
pp. 4818-4821
Author(s):  
Nak-Jin Son ◽  
Haewook Han ◽  
O-Dae Kwon

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