Generation of thin film micro-optics by crossed deposition through wire-grid masks

1999 ◽  
Author(s):  
Uwe Griebner ◽  
Ruediger Grunwald
Keyword(s):  
Thin Film ◽  
Wire Grid ◽  
Micro Optics

Polarization-dependent thin-film wire-grid reflectarray for terahertz waves

2015 ◽  
Vol 107 (3) ◽  
pp. 031111 ◽  
Author(s):  
Tiaoming Niu ◽  
Aditi Upadhyay ◽  
Withawat Withayachumnankul ◽  
Daniel Headland ◽  
Derek Abbott ◽  
...  
Keyword(s):  
Thin Film ◽  
Terahertz Waves ◽  
Wire Grid

High extinction ratio and low transmission loss thin-film terahertz polarizer with a tunable bilayer metal wire-grid structure

2014 ◽  
Vol 39 (4) ◽  
pp. 793 ◽  
Author(s):  
Zhe Huang ◽  
Edward P. J. Parrott ◽  
Hongkyu Park ◽  
Hau Ping Chan ◽  
Emma Pickwell-MacPherson
Keyword(s):  
Thin Film ◽  
Transmission Loss ◽  
Extinction Ratio ◽  
Metal Wire ◽  
Grid Structure ◽  
Wire Grid ◽  
Low Transmission ◽  
High Extinction Ratio

Femtosecond interference effects generated by refractive thin-film micro-optics

2002 ◽  
Author(s):  
R. Grunwald ◽  
U. Griegner ◽  
F. Tschirschwitz ◽  
E.T.J. Nibbering ◽  
T. Elsaesser ◽  
...  
Keyword(s):  
Thin Film ◽  
Interference Effects ◽  
Micro Optics

Refractive Index Variation of Fe3O4 Thin Film According to Deposition Rate

2015 ◽  
Vol 749 ◽  
pp. 106-110
Author(s):  
Ji Yun Jeong ◽  
Young Tae Cho ◽  
Yoon Gyo Jung
Keyword(s):  
Thin Film ◽  
Refractive Index ◽  
Research Result ◽  
Deposition Process ◽  
Flexible Displays ◽  
Wire Grid ◽  
A Value ◽  
Index Variation ◽  
High Possibility ◽  
Very High

Recently, the display industry is focusing on making bendable or flexible displays with higher quality and larger area. Ultimately, there is a very high possibility that future displays will be rollable. The biggest problem with rollable displays is the fabrication of a polarizer film to prevent reflection of the OLED. To develop a rollable display, the display should be made of material with a very thin thickness, like that of paper. However, the thickness of the polarizer film used for displays is only approximately 180 μm. This means that the film is too thick to be applied to rollable displays. If a polarizer of wire grid type, which we investigate in this study, is used, it can reduce the thickness of this film to a value under approximately 1 μm. One research result has been to discover that Fe3O4is a very slightly absorptive material. Especially, most research into Fe3O4thin films has concentrated on its characteristics in nanotubes. So, our purpose in this research is to investigate the deposition process of Fe3O4thin-film under various conditions using an E-beam evaporator; we intend to compare these various processes with each other after measuring the refractive index.

scholarly journals Chromium plasmonic polarizer for high intensity light

2017 ◽  
Vol 9 (3) ◽  
pp. 76 ◽  
Author(s):  
Damian Arkadiusz Michalik ◽  
Paweł S. Jung ◽  
Bartłomiej W. Klus ◽  
Andrzej Kowalik ◽  
Anna Rojek ◽  
...  
Keyword(s):  
Thin Film ◽  
High Intensity ◽  
Fdtd Method ◽  
Visible Region ◽  
Visible Spectrum ◽  
Optical Element ◽  
Perfect Absorber ◽  
Wire Grid ◽  
Circuit Components ◽  
Wire Grid Polarizer

In this work, we investigate a thin-film polarizer for a high intensity of the electromagnetic (EM) beam based on Cr nano wire arrays. Commonly used thin-film polarizing components are very sensitive for high power of EM waves and can be easily damaged by focused beams. The solution to this problem could be the thin-film polarizer based on metallic subwavelengths structures. This type of optical element has huge resistance comparing to typical thin-film polarizers. However, designing such an optical element for proper wavelength of EM wave and transmissions is not easy task. In this paper we present numerical as well as experimental results for specially designed chromium thin-film polarizer for wavelength 532nm Full Text: PDF ReferencesW. Zhou, K. Li, C. Song, P. Hao, M. Chi, M. Yu and Y. Wu, "Polarization-independent and omnidirectional nearly perfect absorber with ultra-thin 2D subwavelength metal grating in the visible region", Opt. Express 23, 11 (2015). CrossRef W. L. Barnes, A . Dereux, and T. W. Ebbesen, "Surface plasmon subwavelength optics", Nature 424, 824-830 (2003). CrossRef C. Lee, E. Sim, D. Kim, "Blazed wire-grid polarizer for plasmon-enhanced polarization extinction: design and analysis", Opt. Express 25, 7 (2017). CrossRef A. Lehmuskero, Metallic thin film structures and polarization shaping gratings (University of Eastern Finland 2010).Y. Leroux, J. C. Lacroix, C. Fave, V. Stockhausen, N. Felidj, J. Grandm, A. Hohenau, J. R. Krenn, "Active plasmonic devices with anisotropic optical response: a step toward active polarizer", Nano Lett. 5, 9 (2009). CrossRef R. T. Perkins, D. P. Hansen, E. W. Gardner, J. M. Thorne, A. A. Robbins, Broadband wire grid polarizer for the visible spectrum, US 6122103 (2000). DirectLink D. M. Sullivan, Electromagnetic simulation using the FDTD method, New York: IEEE Press Series (2000). CrossRef J. P. Berenger, Perfectly Matched Layer (PML) for Computational Electromagnetics, Morgan & Claypool Publishers (2007). CrossRef Yu, W., and R. Mittra, "A conformal FDTD software package modeling antennas and microstrip circuit components", IEEE Antennas Propagat. Magazine 42, 28 (2000) . CrossRef L. W. Bos, D. W. Lynch, "Optical Properties of Antiferromagnetic Chromium and Dilute Cr-Mn and Cr-Re Alloys", Phys. Rev. Sect. B, 2, 4267 (1970). CrossRef

Smart spatio-temporal beam shaping with thin-film micro-optics

2008 ◽  
Author(s):  
Ruediger Grunwald ◽  
Martin Bock ◽  
Silke Huferath-von Luepke
Keyword(s):  
Thin Film ◽  
Beam Shaping ◽  
Micro Optics ◽  
Spatio Temporal
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