Practical manufacturing technique for reducing charge-induced gate oxide degradation during ion implantation

1999 ◽  
Author(s):  
Kenneth G. Moerschel ◽  
W. A. Possanza ◽  
James Sung ◽  
M. A. Prozonic ◽  
T. Long ◽  
...  
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pp. 124313 ◽  
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T. P. Chen ◽  
J. I. Wong ◽  
C. Y. Ng ◽  
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Vol 64 ◽  
pp. 415-418 ◽  
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F. Fouquet ◽  
P. Dherbecourt ◽  
M. Masmoudi ◽  
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Vol 17 (6) ◽  
pp. 288-290 ◽  
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Y.D. Chan ◽  
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1998 ◽  
Vol 37 (Part 1, No. 4B) ◽  
pp. 2321-2324 ◽  
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Takahiro Maruyama ◽  
Nobuo Fujiwara ◽  
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Keyword(s):  

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