Advanced negative i-line resist development on metal surfaces for next-generation lithography mask fabrication

1999 ◽  
Author(s):  
Craig L. Ghelli ◽  
David P. Mancini ◽  
Douglas J. Resnick ◽  
Pawitter J. S. Mangat ◽  
William J. Dauksher
Keyword(s):  
Metal Surfaces ◽  
Next Generation ◽  
Next Generation Lithography ◽  
Mask Fabrication

Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

2001 ◽  
Author(s):  
Christopher Magg ◽  
Michael J. Lercel ◽  
Mark Lawliss ◽  
Ranee W. Kwong ◽  
Wu-Song Huang ◽  
...  
Keyword(s):  
Next Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Next Generation Lithography ◽  
Mask Fabrication

Reduce process bias of photomask manufacturing for next-generation lithography

2004 ◽  
Author(s):  
Booky Lee ◽  
Sharon Wang ◽  
Toroy Tian ◽  
Samuel Yang ◽  
Roy Chen
Keyword(s):  
Next Generation ◽  
Next Generation Lithography

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

2009 ◽  
Author(s):  
Ryoichi Hirano ◽  
Masatoshi Hirono ◽  
Riki Ogawa ◽  
Nobutaka Kikuiri ◽  
Kenichi Takahara ◽  
...  
Keyword(s):  
Super Resolution ◽  
Next Generation ◽  
Resolution Method ◽  
Mask Inspection ◽  
Mask Fabrication

E-beam writing: a next-generation lithography approach for thin-film head critical features

2002 ◽  
Vol 38 (1) ◽  
pp. 95-100 ◽  
Author(s):  
R.E. Fontana ◽  
J. Katine ◽  
M. Rooks ◽  
R. Viswanathan ◽  
J. Lille ◽  
...  
Keyword(s):  
Thin Film ◽  
Next Generation ◽  
Next Generation Lithography
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