Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience
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Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.12001-0 ◽

2016 ◽

pp. iv

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EUV lithography process challenges

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.00004-1 ◽

2016 ◽

pp. 135-176 ◽

Cited By ~ 4

Author(s):

Elizabeth Buitrago ◽

Tero S. Kulmala ◽

Roberto Fallica ◽

Yasin Ekinci

Keyword(s):

Lithography Process ◽

Euv Lithography

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Alternative resist approaches

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.00013-2 ◽

2016 ◽

pp. 447-478

Author(s):

Alex P.G. Robinson ◽

Richard A. Lawson

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Next generation lithography—the rise of unconventional methods?

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.00014-4 ◽

2016 ◽

pp. 479-495 ◽

Cited By ~ 2

Author(s):

Marcus Kaestner ◽

Yana Krivoshapkina ◽

Ivo W. Rangelow

Keyword(s):

Next Generation ◽

Next Generation Lithography ◽

Unconventional Methods

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Frontiers of Nanoscience

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.21003-x ◽

2016 ◽

pp. ii

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List of abbreviations

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.21005-3 ◽

2016 ◽

pp. xxiii-xxv

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Theory

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.00003-x ◽

2016 ◽

pp. 115-133 ◽

Cited By ~ 10

Author(s):

Willem F. van Dorp

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Front Matter

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.21001-6 ◽

2016 ◽

pp. iii

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Preface

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.22001-2 ◽

2016 ◽

pp. xix-xx

Author(s):

Alex P.G. Robinson ◽

Richard A. Lawson

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Tip-based nanolithography methods and materials

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience ◽

10.1016/b978-0-08-100354-1.00015-6 ◽

2016 ◽

pp. 497-542 ◽

Cited By ~ 2

Author(s):

Yana Krivoshapkina ◽

Marcus Kaestner ◽

Ivo W. Rangelow

Download Full-text

Materials and Processes for Next Generation Lithography - Frontiers of NanoscienceLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Elsevier

Copyright

EUV lithography process challenges

Alternative resist approaches

Next generation lithography—the rise of unconventional methods?

Frontiers of Nanoscience

List of abbreviations

Theory

Front Matter

Preface

Tip-based nanolithography methods and materials

Materials and Processes for Next Generation Lithography - Frontiers of Nanoscience
Latest Publications