High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography

1999 ◽  
Author(s):  
William T. Silfvast ◽  
M. Klosner ◽  
Gregory M. Shimkaveg ◽  
Howard Bender ◽  
Glenn D. Kubiak ◽  
...  
Keyword(s):  
High Power ◽  
Plasma Discharge ◽  
Discharge Source ◽  
Euv Lithography

Atmospheric-pressure argon/oxygen plasma-discharge source with a stepped electrode

2007 ◽  
Vol 90 (5) ◽  
pp. 051504 ◽  
Author(s):  
Jin-Pyo Lim ◽  
Han S. Uhm ◽  
Shou-Zhe Li
Keyword(s):  
Atmospheric Pressure ◽  
Oxygen Plasma ◽  
Plasma Discharge ◽  
Discharge Source

High-Power, High-Repetition-Rate Pulsed CO2 Lasers and their application in EUV lithography sources

2016 ◽  
Author(s):  
Yezheng Tao ◽  
Alex Schafgans ◽  
Slava Rokitski ◽  
Michael Kats ◽  
Jayson Stewart ◽  
...  
Keyword(s):  
High Power ◽  
Repetition Rate ◽  
High Repetition Rate ◽  
Co2 Lasers ◽  
High Repetition ◽  
Euv Lithography

Kinetic study of instability growth rate in a helicon plasma discharge source

2017 ◽  
Vol 57 (6-7) ◽  
pp. 272-281
Author(s):  
Rokhsare Jaafarian ◽  
Alireza Ganjovi ◽  
Gholam Reza Etaati
Keyword(s):  
Growth Rate ◽  
Kinetic Study ◽  
Plasma Discharge ◽  
Instability Growth Rate ◽  
Helicon Plasma ◽  
Discharge Source ◽  
Instability Growth

Development of large volume double ring penning plasma discharge source for efficient light emissions

2012 ◽  
Vol 83 (12) ◽  
pp. 123502 ◽  
Author(s):  
Ram Prakash ◽  
Gheesa Lal Vyas ◽  
Jalaj Jain ◽  
Jitendra Prajapati ◽  
Udit Narayan Pal ◽  
...  
Keyword(s):  
Large Volume ◽  
Plasma Discharge ◽  
Double Ring ◽  
Discharge Source

High-power EUV lithography sources based on gas discharges and laser-produced plasmas

2003 ◽  
Author(s):  
Uwe Stamm ◽  
Imtiaz Ahmad ◽  
Istvan Balogh ◽  
H. Birner ◽  
D. Bolshukhin ◽  
...  
Keyword(s):  
High Power ◽  
Gas Discharges ◽  
Euv Lithography

Resist outgassing characterization for qualification in high power EUV lithography

2012 ◽  
Author(s):  
Toshiya Takahashi ◽  
Norihiko Sugie ◽  
Kazuhiro Katayama ◽  
Isamu Takagi ◽  
Yukiko Kikuchi ◽  
...  
Keyword(s):  
High Power ◽  
Euv Lithography

scholarly journals High-power EUV lithography: spectral purity and imaging performance

2020 ◽  
Vol 19 (03) ◽  
Author(s):  
Mark van de Kerkhof ◽  
Fei Liu ◽  
Marieke Meeuwissen ◽  
Xueqing Zhang ◽  
Muharrem Bayraktar ◽  
...  
Keyword(s):  
High Power ◽  
Spectral Purity ◽  
Euv Lithography ◽  
Imaging Performance
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