Non-chemically amplified 193-nm top surface imaging photoresist development: polymer substituent and polydispersity effects

1999 ◽  
Author(s):  
Myoung-Soo Kim ◽  
Hyoung-Gi Kim ◽  
Hyeong-Soo Kim ◽  
Ki-Ho Baik ◽  
Donald W. Johnson ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Chemically Amplified ◽  
Top Surface Imaging ◽  
193 Nm

Progress in 193-nm top-surface imaging process development

1998 ◽  
Author(s):  
John M. Hutchinson ◽  
Veena Rao ◽  
Guojing Zhang ◽  
Adam R. Pawloski ◽  
Carlos A. Fonseca ◽  
...  
Keyword(s):  
Process Development ◽  
Surface Imaging ◽  
Top Surface Imaging ◽  
193 Nm

scholarly journals Study of high photo-speed top surface imaging process using chemically amplified resist.

1998 ◽  
Vol 11 (4) ◽  
pp. 613-618
Author(s):  
Shigeyasu Mori ◽  
Nobuyuki Matsuzawa ◽  
Yuko Kaimoto ◽  
Masayuki Endo ◽  
Takahiro Matsuo ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Top Surface Imaging

Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system

2000 ◽  
Vol 18 (5) ◽  
pp. 2551 ◽  
Author(s):  
Mark H. Somervell ◽  
David S. Fryer ◽  
Brian Osborn ◽  
Kyle Patterson ◽  
Jeffrey Byers ◽  
...  
Keyword(s):  
Imaging System ◽  
Surface Imaging ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Top Surface Imaging ◽  
193 Nm

Further developments for 193 nm top surface imaging resist

1998 ◽  
Vol 41-42 ◽  
pp. 347-350
Author(s):  
D.W. Johnson ◽  
M.I. Egbe ◽  
C. Chen ◽  
Y. Liao ◽  
S. Dionisio ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Top Surface Imaging ◽  
193 Nm

Optimization of a Top-Surface Imaging Process for 193-nm Lithography.

1999 ◽  
Vol 12 (4) ◽  
pp. 679-686 ◽  
Author(s):  
Fumikatsu Uesawa ◽  
Masao Saito ◽  
Atsushi Sekiguchi ◽  
Koichi Takeuchi ◽  
Shigeru Moriya
Keyword(s):  
Surface Imaging ◽  
Top Surface Imaging ◽  
193 Nm
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